Product removal apparatus, treatment system, and product removal method

A product removal apparatus comprising:

• a vacuum pump;
• a sensor for measuring the temperature of the inside of the vacuum pump, the thickness of a film of a product in a flow path in the vacuum pump, or the vibration frequency of the vacuum pump;
• a gas supplier for supplying a gas containing hydrogen halide, fluorine, chlorine, chlorine trifluoride, or fluorine radicals to the vacuum pump;
• and
• a control device, wherein
• the control device controls the gas supplier so that the supply of the gas to the vacuum pump is stopped depending on a rate of temperature increase calculated by the control device from the temperature measured by the sensor, the film thickness, or the vibration frequency,
• the sensor comprises a temperature sensor for measuring the temperature of the inside of the vacuum pump, and
• the control device calculates the rate of temperature increase from the temperature measured by the sensor, and controls the gas supplier so that the supply of the gas to the vacuum pump is stopped when the rate of temperature increase starts to decrease.