C25D 21/20
Of rinse-solutions
Official title: of rinse-solutions (C25D21/22 takes precedence)
C25D21/20 (Of rinse-solutions) appears on 40 US grants and 9 published applications in this corpus.
Search patents in C25D- Granted patents
- 40
- Published applications
- 9
- Assignees
- 28
- Inventors
- 67
- Latest grant
- 28 Jan 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 5 | 0 |
| 1981 | 3 | 0 |
| 1982 | 3 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 3 | 0 |
| 2001 | 1 | 1 |
| 2002 | 1 | 1 |
| 2003 | 0 | 2 |
| 2004 | 2 | 1 |
| 2005 | 0 | 0 |
| 2006 | 2 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 1 | 1 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 0 |
| 2024 | 1 | 1 |
| 2025 | 1 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Nanofiltration for wafer rinsing28 Jan 2025US 12,209,325 B2APPLIED Materials.Inc.
- Method and system for depositing a zinc-nickel alloy on a substrate2 Apr 2024US 11,946,152 B2Atotech Deutschland GmbH
- Method of recovering metal ions recyclable as soluble anode from waste plating solutions14 Sep 2010US 7,794,582 B1EW Metals LLC
- Processing solution preparation and supply method and apparatus5 Sep 2006US 7,101,517 B2Hirama Laboratories Co., Ltd.
- Method for recovering useful components from electrolytic phosphate chemical treatment bath10 Jan 2006US 6,984,300 B2Denso Corporation
- Method for depositing a zinc-nickel alloy on a substrate, an aqueous zinc-nickel deposition bath, a brightening agent and use thereof25 Sep 2025US 2025/0297398 A1Atotech Deutschland GmbH
- Nanofiltration for wafer rinsing5 Sep 2024US 2024/0295046 A1APPLIED Materials.Inc.
- Method and system for depositing a zinc-nickel alloy on a substrate3 Nov 2022US 2022/0349080 A1Atotech Deutschland GmbH
- Electrodeposition of hard to deposit materials on aluminum and other substrates using improved water saving mercy cell9 Dec 2010US 2010/0310903 A1
- Method for recovering useful components from electrolytic phosphate chemical treatment bath29 Jan 2004US 2004/0016649 A1Denso Corporation
Most cited
By later US patents
- Electroplating chamber with rotatable wafer holder and pre-wetting and rinsing capability158US 6,099,702 ANovellus Systems, Inc. · 2000
- Water recycle treatment system for use in metal processing41US 3,973,987 AData General Corporation · 1976
- Plating waste water treatment and metals recovery system29US 6,162,361 A2000
- Electrolytic treatment of plating wastes27US 4,226,685 AKennecott Copper Corporation · 1980
- Separation and recovery of reusable heavy metal hydroxides from metal finishing wastewaters21US 4,680,126 A1987