C11D 3/2055
Unsaturated
Official title: {unsaturated}
C11D3/2055 (Unsaturated) appears on 16 US grants and 10 published applications in this corpus.
Search patents in C11D- Granted patents
- 16
- Published applications
- 10
- Assignees
- 13
- Inventors
- 52
- Latest grant
- 3 May 2022
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 4 |
| 2003 | 0 | 0 |
| 2004 | 2 | 1 |
| 2005 | 0 | 1 |
| 2006 | 2 | 0 |
| 2007 | 1 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 1 | 2 |
| 2020 | 0 | 0 |
| 2021 | 1 | 1 |
| 2022 | 1 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 0 |
| 2025 | 0 | 0 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Cleaning liquid for aqueous ink comprising an acetylene glycol-based surfactant3 May 2022US 11,319,507 B2Kao Corporation
- Cleaning liquid for aqueous ink20 Apr 2021US 10,981,385 B2Kao Corporation
- Rinse composition, a method for forming resist patterns and a method for making semiconductor devices22 Oct 2019US 10,451,974 B2Az Electronic Materials (Luxembourg) S.A.R.L.
- Cleaning composition and method of cleaning a semiconductor device using the same18 Dec 2007US 7,309,683 B2Samsung Electronics Co., Ltd.
- Low VOC cleanroom cleaning wipe18 Jul 2006US 7,078,358 B2Air Products and Chemicals, Inc.
- Water-dilutable voc-free cleaning compositions9 Jul 2026US 2026/0193568 A1Chemetall GmbH
- Cleaning liquid for aqueous ink9 Sep 2021US 2021/0277331 A1Kao Corporation
- Cleaning liquid for aqueous ink31 Oct 2019US 2019/0329553 A1Kao Corporation
- A rinse composition, a method for forming resist patterns and a method for making semiconductor devices15 Aug 2019US 2019/0250515 A1Az Electronic Materials (Luxembourg) S.A.R.L.
- Cleaning composition and method of cleaning a semiconductor device using the same4 Aug 2005US 2005/0170981 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Detergent compositions which contain certain tertiary alcohols62US 4,287,080 AThe Procter & Gamble Company · 1981
- Solid, transparent soap composition based on fatty acid salts and containing isoprene glycol22US 5,496,489 AL'oreal · 1996
- Concentrated fabric softening composition21US 6,335,315 B12002
- Composition for cleaning hard surfaces17US 6,090,765 AChurch & Dwight Co., Inc. · 2000
- Thickener for aqueous compositions12US 5,501,813 AHenkel Corporation · 1996