C08F 220/40
Esters of unsaturated alcohols
Official title: Esters of unsaturated alcohols {, e.g. allyl (meth)acrylate}
C08F220/40 (Esters of unsaturated alcohols) appears on 165 US grants and 206 published applications in this corpus.
Search patents in C08F- Granted patents
- 165
- Published applications
- 206
- Assignees
- 117
- Inventors
- 530
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 6 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 1 |
| 2003 | 2 | 5 |
| 2004 | 2 | 1 |
| 2005 | 1 | 3 |
| 2006 | 2 | 4 |
| 2007 | 4 | 8 |
| 2008 | 3 | 10 |
| 2009 | 4 | 5 |
| 2010 | 7 | 9 |
| 2011 | 5 | 6 |
| 2012 | 1 | 7 |
| 2013 | 5 | 7 |
| 2014 | 10 | 12 |
| 2015 | 8 | 5 |
| 2016 | 6 | 7 |
| 2017 | 7 | 7 |
| 2018 | 6 | 4 |
| 2019 | 5 | 10 |
| 2020 | 3 | 9 |
| 2021 | 8 | 21 |
| 2022 | 5 | 19 |
| 2023 | 14 | 13 |
| 2024 | 20 | 9 |
| 2025 | 7 | 10 |
| 2026 | 5 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Optical laminate, polarizing plate, and image device display15 Sep 2026US 12,736,729 B2FUJIFILM Corporation
- Copolymer for polymer electrolyte, and gel polymer electrolyte and lithium secondary battery which include the same14 Jul 2026US 12,679,918 B2LG Energy Solution, Ltd.
- Composition, coating, film, and base material14 Jul 2026US 12,679,965 B2Kuraray Co., Ltd.
- Oxirane-functional vinyl monomers and methods for making the same2 Jun 2026US 12,644,007 B2Swimc LLC
- Curable compositions containing thiol compounds12 May 2026US 12,624,167 B2Arkema France
- Resist composition, resist pattern formation method, compound, and polymer compound8 Oct 2026US 2026/0310077 A1Tokyo Ohka Kogyo.Co., Ltd.
- Radiation-sensitive composition, resist pattern formation method, polymer, and compound17 Sep 2026US 2026/0277103 A1Jsr Corporation
- Radiation-sensitive composition, method for forming pattern, polymer, and compound3 Sep 2026US 2026/0259498 A1Jsr Corporation
- Resist composition, resist pattern formation method, compound, and polymer compound13 Aug 2026US 2026/0235954 A1Tokyo Ohka Kogyo.Co., Ltd.
- Sulfonium salt, chemically amplified resist composition, and pattern forming process30 Jul 2026US 2026/0219569 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Superabsorbent polymer with high permeability71US 7,169,843 B2Stockhausen GmbH & Co. KG · 2007
- Precipitation polymerization process for producing an oil adsorbent polymer capable of entrapping solid particles and liquids and the product thereof52US 6,387,995 B1AMCOL International Corporation · 2002
- Waterborne polymers having pendant allyl groups42US 5,539,073 AEastman Chemical Company · 1996
- Contact lens42US 7,588,334 B2Menicon Co., Ltd. · 2009
- Reactive diluent and curable resin composition40US 6,767,980 B2Nippon Shokubai Co., Ltd. · 2004