C08F 22/24
Esters containing sulfur
C08F22/24 (Esters containing sulfur) appears on 29 US grants and 39 published applications in this corpus.
Search patents in C08F- Granted patents
- 29
- Published applications
- 39
- Assignees
- 17
- Inventors
- 100
- Latest grant
- 25 Nov 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 1 |
| 2003 | 1 | 1 |
| 2004 | 1 | 2 |
| 2005 | 1 | 1 |
| 2006 | 2 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 2 |
| 2012 | 0 | 1 |
| 2013 | 1 | 0 |
| 2014 | 2 | 1 |
| 2015 | 1 | 2 |
| 2016 | 1 | 1 |
| 2017 | 2 | 4 |
| 2018 | 2 | 0 |
| 2019 | 4 | 2 |
| 2020 | 0 | 3 |
| 2021 | 2 | 4 |
| 2022 | 0 | 2 |
| 2023 | 1 | 1 |
| 2024 | 2 | 4 |
| 2025 | 2 | 2 |
| 2026 | 0 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Polymerizable liquid crystal compound, polymerizable composition, polymer, retardation film, method for producing retardation film, transfer laminate, optical member, method for producing optical member, and display device25 Nov 2025US 12,480,051 B2Dai Nippon Printing Co.Ltd.
- (Meth)acrylate and use thereof14 Oct 2025US 12,441,821 B2Mitsui Chemicals, Inc.
- Curable composition, cured product, and compound12 Nov 2024US 12,139,567 B2Tokyo Ohka Kogyo.Co., Ltd.
- Multilayer phase difference plate, polarizing plate, and image display device16 Jul 2024US 12,038,650 B2Zeon Corporation
- Polymerizable liquid crystal compound, polymerizable composition, polymer, retardation film, method for producing retardation film, transfer laminate, optical member, method for producing optical member, and display device24 Jan 2023US 11,560,518 B2Dai Nippon Printing Co.Ltd.
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process8 Oct 2026US 2026/0310075 A1Shin-Etsu Chemical Co., Ltd.
- Salt, acid generator, resin, resist composition, and method for producing resist pattern24 Sep 2026US 2026/0288002 A1Sumitomo Chemical Company, Limited
- Radiation-sensitive composition and method for forming resist pattern30 Jul 2026US 2026/0219577 A1Jsr Corporation
- Radiation-sensitive composition and method for forming resist pattern23 Jul 2026US 2026/0211327 A1Jsr Corporation
- Chemically amplified negative resist composition and resist pattern forming process5 Mar 2026US 2026/0063998 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Sulfur-containing unsaturated carboxylate compound and its cured products19US 6,458,908 B1Mitsui Chemicals, Inc. · 2002
- Acrylic thio monomers15US 6,172,140 B2Sola International Holdings Ltd. · 2001
- Colorants containing copolymerizable vinyl groups and sulfonamide linkages8US 6,620,858 B2Eastman Chemical Company · 2003
- Polymerizable compound, polymerizable composition, polymer, optically anisotropic body, and method for producing polymerizable compound8US 9,586,917 B2Zeon Corporation · 2017
- Compound containing mesogenic group, and mixture, composition, and optically anisotropic body using said compound6US 10,473,820 B2DIC Corporation · 2019