C08F 20/38
Esters containing sulfur
C08F20/38 (Esters containing sulfur) appears on 173 US grants and 160 published applications in this corpus.
Search patents in C08F- Granted patents
- 173
- Published applications
- 160
- Assignees
- 109
- Inventors
- 535
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 3 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 5 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 3 | 0 |
| 1994 | 2 | 0 |
| 1995 | 6 | 0 |
| 1996 | 5 | 0 |
| 1997 | 5 | 0 |
| 1998 | 4 | 0 |
| 1999 | 4 | 0 |
| 2000 | 1 | 0 |
| 2001 | 5 | 3 |
| 2002 | 4 | 3 |
| 2003 | 3 | 2 |
| 2004 | 2 | 0 |
| 2005 | 0 | 0 |
| 2006 | 1 | 0 |
| 2007 | 1 | 0 |
| 2008 | 0 | 3 |
| 2009 | 1 | 3 |
| 2010 | 1 | 8 |
| 2011 | 4 | 8 |
| 2012 | 6 | 3 |
| 2013 | 5 | 8 |
| 2014 | 5 | 6 |
| 2015 | 10 | 2 |
| 2016 | 6 | 3 |
| 2017 | 4 | 10 |
| 2018 | 4 | 17 |
| 2019 | 8 | 16 |
| 2020 | 8 | 17 |
| 2021 | 10 | 6 |
| 2022 | 9 | 10 |
| 2023 | 3 | 4 |
| 2024 | 7 | 13 |
| 2025 | 6 | 6 |
| 2026 | 4 | 9 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Compound, polymerizable composition, polymer, holographic recording medium, optical material, and optical component25 Aug 2026US 12,717,227 B2Mitsubishi Chemical Corporation
- Polymerizable composition, polymer, ultraviolet shielding material, laminate, compound, ultraviolet absorbing agent, and method of producing compound23 Jun 2026US 12,662,558 B2FUJIFILM Corporation
- Polymer solid electrolyte, method for producing same, and electrochemical device9 Jun 2026US 12,651,770 B2Murata Manufacturing Co., Ltd.
- Compound, composition, cured product, optically anisotropic body, optical element, and light guide element17 Mar 2026US 12,577,469 B2FUJIFILM Corporation
- Polymerization reactor for production of super absorbent polymer28 Oct 2025US 12,454,585 B2LG Chem.Ltd.
- Compositions, uses, and methods8 Oct 2026US 2026/0308341 A1Innospec Limited
- Sulfonium salt, chemically amplified resist composition, and pattern forming method30 Jul 2026US 2026/0219572 A1Shin-Etsu Chemical Co., Ltd.
- Onium salt, chemically amplified positive resist composition and resist pattern forming process18 Jun 2026US 2026/0169379 A1Shin-Etsu Chemical Co., Ltd.
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process14 May 2026US 2026/0133491 A1Shin-Etsu Chemical Co., Ltd.
- Liquid crystal composition, benzoquinone derivative, liquid crystal cured layer, optical film, polarizing plate, and image display device12 Mar 2026US 2026/0071125 A1FUJIFILM Corporation
Most cited
By later US patents
- Polymer particles95US 9,688,788 B2Terumo Kabushiki Kaisha · 2017
- Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process79US 7,569,326 B2Shin-Etsu Chemical Co., Ltd. · 2009
- Thiolcarboxylic acid esters55US 4,810,812 ANippon Shokubai Kagaku Kogyo Co., Ltd. · 1989
- Methylene beta-diketone monomers, methods for making methylene beta-diketone monomers, polymerizable compositions and products formed therefrom54US 9,221,739 B2Sirrus, Inc. · 2015
- Halogenated acrylates and polymers derived therefrom47US 6,005,137 A3M Innovative Properties Company · 1999