Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsYouichi Ohsawa, Masaki Ohashi, Seiichiro Tachibana, Jun Hatakeyama, Takeru Watanabe
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Abstract
A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically amplified resist compositions. It is useful as a monomer from which a base resin for use in radiation-sensitive resist compositions is derived.
Claims11
A polymer capable of generating a sulfonic acid in response to high-energy radiation or heat, said sulfonic acid comprising recurring units of the general formula (1a):
- wherein R1 is hydrogen, fluorine, methyl or trifluoromethyl.
A sulfonium salt having a polymerizable anion, represented by the general formula (1):
- wherein R1 is hydrogen, fluorine, methyl or trifluoromethyl, R2, R3 and R4 are each independently a substituted or unsubstituted, straight or branched alkyl, alkenyl or oxoalkyl group of 1 to 10 carbon atoms, or a substituted or unsubstituted aryl, aralkyl or aryloxoalkyl group of 6 to 18 carbon atoms, or at least two of R2, R3 and R4 may bond together to form a ring with the sulfur atom.
A polymer comprising recurring units of the general formula (2):
- wherein R1 is hydrogen, fluorine, methyl or trifluoromethyl, R2, R3 and R4 are each independently a substituted or unsubstituted, straight or branched alkyl, alkenyl or oxoalkyl group of 1 to 10 carbon atoms, or a substituted or unsubstituted aryl, aralkyl or aryloxoalkyl group of 6 to 18 carbon atoms, or at least two of R2, R3 and R4 may bond together to form a ring with the sulfur atom.
Dependencies are inferred from the claim text.