C07C 59/295
Containing halogen
Official title: containing halogen
C07C59/295 (Containing halogen) appears on 8 US grants and 2 published applications in this corpus.
Search patents in C07C- Granted patents
- 8
- Published applications
- 2
- Assignees
- 4
- Inventors
- 9
- Latest grant
- 9 May 2017
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 5 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 1 | 1 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 1 |
| 2017 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Photoresist with top-coating photo-decomposable base for photolithography9 May 2017US 9,645,499 B2Semiconductor Manufacturing International (Shanghai) Corporation
- Photodecomposable bases and photoresist compositions24 Dec 2013US 8,614,047 B2International Business Machines Corporation
- Chlorocitric acids17 Apr 1984US 4,443,619 AHoffmann-La Roche Inc.
- Chlorocitric acids21 Dec 1982US 4,365,070 AHoffmann-La Roche Inc.
- Chlorocitric acids12 Oct 1982US 4,354,039 AHoffmann-La Roche Inc.
Most cited
By later US patents
- Photodecomposable bases and photoresist compositions470US 8,614,047 B2International Business Machines Corporation · 2013
- Chlorocitric acids5US 4,443,619 AHoffmann-La Roche Inc. · 1984
- Chlorocitric acids1US 4,354,039 AHoffmann-La Roche Inc. · 1982
- Photoresist with top-coating photo-decomposable base for photolithography1US 9,645,499 B2Semiconductor Manufacturing International (Shanghai) Corporation · 2017