C07C 309/52
The carbon skeleton being further substituted by doubly-bound oxygen atoms
Official title: the carbon skeleton being further substituted by doubly-bound oxygen atoms
C07C309/52 (The carbon skeleton being further substituted by doubly-bound oxygen atoms) appears on 16 US grants and 10 published applications in this corpus.
Search patents in C07C- Granted patents
- 16
- Published applications
- 10
- Assignees
- 18
- Inventors
- 47
- Latest grant
- 7 Apr 2020
Filings by year
| Year | Granted patents | Published applications |
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| 1978 | 1 | 0 |
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| 2013 | 0 | 1 |
| 2014 | 1 | 1 |
| 2015 | 0 | 0 |
| 2016 | 1 | 2 |
| 2017 | 1 | 0 |
| 2018 | 1 | 3 |
| 2019 | 0 | 0 |
| 2020 | 2 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 1 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Resist composition and patterning process7 Apr 2020US 10,613,436 B2Shin-Etsu Chemical Co., Ltd.
- Resist composition and patterning process7 Apr 2020US 10,613,437 B2Shin-Etsu Chemical Co., Ltd.
- Anthraquinone compounds and their uses30 Jan 2018US 9,877,940 B2Dundalk Institute of Technology
- Immunomodulator and anti-inflammatory compounds12 Sep 2017US 9,758,474 B2Incozen Therapeutics Pvt. Ltd.
- Quenching dye for labeling biomolecules and method for preparing the same6 Dec 2016US 9,512,315 B2Dkc Corporation
- Depalmitoylating compositions and the use thereof13 Apr 2023US 2023/0114304 A1The Regents of the University of California
- Resist composition and patterning process27 Sep 2018US 2018/0275512 A1Shin-Etsu Chemical Co., Ltd.
- Resist composition and patterning process20 Sep 2018US 2018/0267402 A1Shin-Etsu Chemical Co., Ltd.
- Reversibly reducible materials and use thereof12 Apr 2018US 2018/0099917 A1University of Kentucky Research Foundation
- Quenching dye for labeling biomolecules and method for preparing the same15 Sep 2016US 2016/0266130 A1Dkc Corporation
Most cited
By later US patents
- Class of three tail surfactants law38831US 5,672,739 AExxon Research & Engineering Co. · 1997
- Tetraphenol compounds and process for producing the same9US 5,726,217 ASumitomo Chemical Company, Limited · 1998
- Compounds containing hydroxyl groups and urethano-aryl-sulfonic acid groups8US 4,224,418 ABayer Aktiengesellschaft · 1980
- Photosensitive compound7US 5,250,669 AMatsushita Electric Industrial Co., Ltd. · 1993
- Resist composition and patterning process6US 10,613,437 B2Shin-Etsu Chemical Co., Ltd. · 2020