C02F 2103/346
From semiconductor processing
Official title: {from semiconductor processing, e.g. waste water from polishing of wafers}
C02F2103/346 (From semiconductor processing) appears on 249 US grants and 379 published applications in this corpus.
Search patents in C02F- Granted patents
- 249
- Published applications
- 379
- Assignees
- 207
- Inventors
- 926
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 8 | 0 |
| 2000 | 4 | 0 |
| 2001 | 10 | 3 |
| 2002 | 15 | 8 |
| 2003 | 5 | 6 |
| 2004 | 6 | 8 |
| 2005 | 6 | 16 |
| 2006 | 3 | 8 |
| 2007 | 7 | 13 |
| 2008 | 4 | 14 |
| 2009 | 5 | 11 |
| 2010 | 5 | 13 |
| 2011 | 13 | 22 |
| 2012 | 5 | 6 |
| 2013 | 4 | 4 |
| 2014 | 8 | 15 |
| 2015 | 4 | 12 |
| 2016 | 7 | 13 |
| 2017 | 13 | 12 |
| 2018 | 9 | 15 |
| 2019 | 15 | 15 |
| 2020 | 8 | 13 |
| 2021 | 12 | 20 |
| 2022 | 12 | 18 |
| 2023 | 10 | 31 |
| 2024 | 15 | 27 |
| 2025 | 16 | 25 |
| 2026 | 13 | 31 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Recycling and purifying structure for distiller1 Sep 2026US 12,722,100 B2
- Methods and systems for electrochemical oxidation of polyfluoroalkyl and perfluoroalkyl contaminants25 Aug 2026US 12,715,794 B2University of Georgia Research Foundation, Inc.
- Electrostatic purification device of fluid, fluid purification facility, and method of purifying fluid14 Jul 2026US 12,678,803 B2Samsung Electronics Co., Ltd.
- Ultrapure water production system, semiconductor processing system including the same, and semiconductor fabrication method using the same23 Jun 2026US 12,662,405 B2Samsung Electronics Co., Ltd.
- Method for selectively removing perfluorinated compounds with electrooxidation26 May 2026US 12,637,369 B2SK hynix Inc.
- Method for metal ion removal from metal-containing solution using fluidized bed homogeneous crystallization24 Sep 2026US 2026/0285717 A1National Chunghsing University
- Water treatment apparatus and water treatment method24 Sep 2026US 2026/0285720 A1Organo Corporation
- Electrostatic purification device of fluid, fluid purification facility, and method of purifying fluid17 Sep 2026US 2026/0273545 A1Samsung Electronics Co., Ltd.
- Method for recycling silicon in wastewater10 Sep 2026US 2026/0265092 A1Samsung Electronics Co., Ltd.
- Resourceful Treatment Method of BOE Waste Liquid3 Sep 2026US 2026/0257948 A1Dongjiang Environmental Company Limited
Most cited
By later US patents
- Simplified ozonator for a semiconductor wafer cleaner350US 6,399,022 B1Fairchild Semiconductor Corporation · 2002
- Method and apparatus for immersion cleaning of semiconductor devices54US 6,021,791 ASpeedFam-IPEC Corporation · 2000
- Flow-through capacitor, system and method53US 6,628,505 B1Biosource, Inc. · 2003
- Process and apparatus for high flow and low pressure impurity removal51US 6,428,705 B1Microbar Incorporated · 2002
- Separation and purification of fluoride from industrial wastes37US 5,876,685 AIPEC Clean, Inc. · 1999