Ultrapure water production system, semiconductor processing system including the same, and semiconductor fabrication method using the same

An ultrapure water production system, comprising:

• a front filtering part configured to filter a fluid;
• and
• a rear filtering part configured to filter the fluid after the fluid is released from the front filtering part, wherein
• the rear filtering part includes
• an ultraviolet (UV) irradiator configured to irradiate a UV ray onto the fluid to remove an organic material from the fluid;
• an anion polisher (ANP) configured to remove hydrogen peroxide from the fluid after the fluid is released from the UV irradiator;
• a connection line that connects the UV irradiator to the ANP, the connection line being in fluid communication with UV irradiator and the ANP;
• a hydrogen peroxide detector on the connection line and configured to detect a concentration of hydrogen peroxide in the fluid after the fluid is released from the UV irradiator;
• and
• a dissolved oxygen (DO) detector on the connection line between the hydrogen peroxide detector and the ANP, the DO detector being configured to measure a concentration of dissolved oxygen in the fluid after the fluid is released from the UV irradiator.