C01F 17/259
Oxyhalides
C01F17/259 (Oxyhalides) appears on 26 US grants and 33 published applications in this corpus.
Search patents in C01F- Granted patents
- 26
- Published applications
- 33
- Assignees
- 25
- Inventors
- 88
- Latest grant
- 14 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 1 |
| 2003 | 2 | 1 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 2 |
| 2009 | 1 | 0 |
| 2010 | 1 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 1 | 2 |
| 2015 | 0 | 0 |
| 2016 | 2 | 0 |
| 2017 | 0 | 1 |
| 2018 | 0 | 1 |
| 2019 | 2 | 2 |
| 2020 | 0 | 4 |
| 2021 | 1 | 1 |
| 2022 | 1 | 3 |
| 2023 | 6 | 6 |
| 2024 | 2 | 5 |
| 2025 | 3 | 1 |
| 2026 | 2 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Sprayed article14 Jul 2026US 12,679,740 B2Shin-Etsu Chemical Co., Ltd.
- Sintered body, method of fabricating the same, semiconductor fabricating device, and method of fabricating semiconductor fabricating device24 Feb 2026US 12,559,381 B2Samsung Electronics Co., Ltd.
- Devices having a rare earth (oxy) fluoride coating for improved resistance to corrosive chemical environments and methods for making and using these devices16 Dec 2025US 12,497,691 B2L Air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation des Procedes Georges Claude
- Yttrium-fluoride-based sprayed coating, sprayed member, and method for producing yttrium-fluoride-based sprayed coating12 Aug 2025US 12,385,122 B2Shin-Etsu Chemical Co., Ltd.
- Crystal of europium compound and method for producing crystal of europium compound15 Apr 2025US 12,276,039 B2Kabushiki Kaisha Ohara
- Sintered body, method of fabricating the same, semiconductor fabricating device, and method of fabricating semiconductor fabricating device30 Apr 2026US 2026/0116773 A1Samsung Electronics Co., Ltd.
- Material for film formation and method for producing coating film20 Nov 2025US 2025/0353757 A1Mitsui Mining & Smelting Co., Ltd.
- Method for producing anion-containing inorganic solid material, device for producing anion-containing inorganic solid material, and anion-containing inorganic solid material24 Oct 2024US 2024/0356007 A1Tohoku University
- Slurry for suspension plasma spraying, method for forming rare earth acid fluoride sprayed film, and spraying member1 Aug 2024US 2024/0254000 A1Shin-Etsu Chemical Co., Ltd.
- Spray coating, sraying powder, spraying powder manufacturing method and spray coating manufacturing method28 Mar 2024US 2024/0102142 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Process and apparatus for oxidizing or reducing dissolved substance64US 4,774,026 AHitachi, Ltd. · 1988
- Rare earth oxide fluoride nanoparticles and hydrothermal method for forming nanoparticles33US 6,316,377 B1Battelle Memorial Institute · 2001
- Cerium based abrasive material9US 6,585,787 B2Mitsui Mining & Smelting Co., Ltd. · 2003
- Nano-scale metal halide scintillation materials and methods for making same9US 7,625,502 B2General Electric Company · 2009
- Rare earth oxide fluoride nanoparticles and hydrothermal method for forming nanoparticles3US 6,667,019 B2Battelle Memorial Institute · 2003