Material for film formation and method for producing coating film
AssigneeMitsui Mining & Smelting Co., Ltd.
InventorsKento MATSUKURA, Yuta TANAKA
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Abstract
A film-forming material is provided in which a rare earth fluoride (REF3) and a rare earth oxyfluoride (RE-O-F) are observed in X-ray diffraction measurement, and SREF3/SRE-O-F that is a ratio of a crystallite size (SREF3) of REF3 relative to a crystallite size (SRE-O-F) of RE-O-F is 0.90 or more and 1.35 or less. It is preferable that the crystallite size of each of REF3 and RE-O-F is 40 nm or more and 100 nm or less. It is also preferable that primary particles observed using a scanning electron microscope (SEM) have an average particle size of 0.1 μm or more and 1.0 μm or less.
Claims11
A film-forming material in which a rare earth fluoride (REF3) and a rare earth oxyfluoride (RE-O-F) are observed in X-ray diffraction measurement,
- wherein SREF3/SRE-O-F that is a ratio of a crystallite size (SREF3) of REF3 relative to a crystallite size (SRE-O-F) of RE-O-F is 0.90 or more and 1.35 or less.
Dependencies are inferred from the claim text.