B08B 9/0865
By burning-out
Official title: {by burning-out (B08B9/40 takes precedence)}
B08B9/0865 (By burning-out) appears on 10 US grants and 15 published applications in this corpus.
Search patents in B08B- Granted patents
- 10
- Published applications
- 15
- Assignees
- 12
- Inventors
- 41
- Latest grant
- 15 Mar 2022
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 3 |
| 2017 | 2 | 3 |
| 2018 | 2 | 4 |
| 2019 | 0 | 0 |
| 2020 | 2 | 1 |
| 2021 | 1 | 0 |
| 2022 | 1 | 1 |
| 2023 | 0 | 1 |
| 2024 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy15 Mar 2022US 11,273,469 B2Tokyo Electron Limited
- Decoking process19 Jan 2021US 10,894,276 B2NOVA Chemicals (International) S.A.
- Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy15 Sep 2020US 10,773,282 B2Tokyo Electron Limited
- Aluminum fluoride mitigation by plasma treatment23 Jun 2020US 10,688,538 B2APPLIED Materials.Inc.
- Method for cleaning substrate10 Jul 2018US 10,020,184 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method for cleaning process chamber and application thereof28 Nov 2024US 2024/0392436 A1Suzhou Maizheng Technology Co., Ltd.
- Pressure decontamination system providing fast cleaning against cbrn threats suitable for use in military vehicles and infrastructures26 Jan 2023US 2023/0022685 A1Nero EndüStri Savunma Sanayi Anonim Sirketi
- Clean-in-place and product recovery method20 Oct 2022US 2022/0331846 A1BWXT Isotope Technology Group, Inc.
- Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy31 Dec 2020US 2020/0406315 A1Tokyo Electron Limited
- Decoking process4 Oct 2018US 2018/0281033 A1NOVA Chemicals (International) S.A.
Most cited
By later US patents
- Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy46US 10,773,282 B2Tokyo Electron Limited · 2020
- Method for stripping and sanitizing a container inner surface and implementing device13US 6,368,554 B1Societe Civile Chateau Leoville las Cases · 2002
- Process of koshering containers4US 4,906,301 ASkolnik Industries, Inc. · 1990
- Method for cleaning plasma processing chamber and substrate3US 9,595,448 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2017
- On-line cleaning control system and control method for carbon deposits in direct injection engine fuel system2US 9,752,499 B22017