FairTech Corporation
Hsinchu City, TW· latest recorded location
FairTech Corporation is named on 3 US grants and 4 published applications in this corpus. Its most frequent classification is G01N (Investigating or analysing materials by determining their chemical or physical properties).
- Granted patents
- 3
- Published applications
- 4
- Inventors
- 2
- Granted in 2026 so far
- 0
- Most recent grant
- 14 May 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2018 | 0 | 2 |
| 2019 | 2 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 0 |
| 2024 | 1 | 1 |
By publication year.
Technology areas
Share of 7 documents
- G01NInvestigating or analysing materials by determining their chemical or physical properties4
- H01JElectric discharge tubes or discharge lamps2
- H03HImpedance networks2
- H03JTuning resonant circuits2
- H10PGeneric processes or apparatus for the manufacture or treatment of devices covered2
- B64CAeroplanes1
- B64FGround or aircraft-carrier-deck installations specially adapted for use in connection with aircraft1
- B64UUnmanned aerial vehicles [uav]1
Recent patents
- System for aerial vehicle landing and method for controlling system for aerial vehicle landing14 May 2024US 11,981,453 B1
- Positioning device for radio frequency matcher19 Feb 2019US 10,211,802 B2
- Method for measuring gas dissociation degrees12 Feb 2019US 10,204,840 B2
- Device measuring a physical state of a material by spectrum and a method thereof3 Oct 2024US 2024/0328929 A1
- Device measuring a physical state of a material by spectrum and a method thereof28 Jul 2022US 2022/0236168 A1
- Method and a device for measuring gas dissociation degrees with an optical spectrometer5 Jul 2018US 2018/0190548 A1
- Positioning device for radio frequency matcher4 Jan 2018US 2018/0006627 A1
Most cited
By later US patents
None of its patents has been cited by a later US patent yet.