Method and a device for measuring gas dissociation degrees with an optical spectrometer

Abstract

In current application of gas, the dissociation degree in some special gas is generally detected and controlled by a physical or chemical method instead of an optical one. Solution schemes that are adopted include but are not limited to adjusting gas flow rates, gas proportioning or gas disposal. But up to now there has not been any definitively effective solution scheme. A primary objective of the present invention is to provide a method and a device for measuring gas dissociation degrees. The principle of the present invention is to detect the gas dissociation degree in a tube body and to calculate the relative dissociation quantity value by means of a device according to the present invention. When the contamination value in a primary path of gas is too high, an appropriate amount of dissociated reactive gas is discharged via a second path to remove contaminants in the primary path to achieve efficient and effective cleaning. The primary path and the second path connected to the primary path are provided for storing reactive gas. The primary path is provided to perform the processes of plasma-assisted deposition, membrane etching and material surface modification to achieve special functions and effects. The present invention may be applied to any device and/or any apparatus that requires measuring of gas dissociation degrees, including but not limited to physical vapor deposition device, chemical vapor deposition device, etching device and any other relevant device in the semiconductor, photoelectric, panel industries and any other relevant industry. The present invention may also be directly disposed in a remote plasma source device. Further, the present invention may be applied in any inspection examination device in the biotechnology, chemistry, applied physics industries and any other relevant industry. Still further, the present invention may be applied to any inspection apparatus or testing platform in the equipment maintenance industry for any of the foregoing industries. A measuring method and a device according to the present invention may be applied in various locations for measuring gas dissociation degrees and are not limited to the chamber referred to in the preferred embodiments. Any location where a gas dissociation degree measuring device is disposed is within the scope of the present invention. The preferred embodiments in the specifications are illustrated of the present invention rather than limiting of the present invention, citing devices for physical vapor deposition, chemical vapor deposition or etching in the semiconductor industry as examples.

Dependencies are inferred from the claim text.