Device measuring a physical state of a material by spectrum and a method thereof
AssigneeFairTech Corporation
InventorsKuan Fu JUANG, Jui Pao PAN
Life of this patent
Estimating the term…
Abstract
The present invention is a device and a method thereof measuring a physical state of a material by spectrum, the device comprising: a first action path where a material to be measured is contained; a detecting unit detecting a spectrum; and a processing unit obtaining a deposition state relating to the material to be measured based on the spectrum. An advance monitoring can be supplied when a deposit is formed by the present invention, therefore, the deposition process can be observed and/or controlled immediately, and the yield and degree of automation will be greatly improved.
Claims11
A device measuring a physical state of a material by spectrum, comprising:
- a first action path where a material to be measured is contained in;
- a detecting unit detecting a spectrum;
- and
- a processing unit obtaining a deposition state relating to the material to be measured based on the spectrum.
A method measuring a physical state of a material by spectrum, comprising:
- detecting a spectrum;
- and
- obtaining a deposition state relating to a material to be measured based on the spectrum.
Dependencies are inferred from the claim text.