Method for measuring gas dissociation degrees
AssigneeFairTech Corporation
InventorJui-Pao Pan
Life of this patent
Estimating the term…
Abstract
A method for measuring gas dissociation degrees is provided. The method comprises the following steps. A reaction process with at least one reactive gas in a main path and a second path connecting to the main path is performed. A plasma gas dissociation degree of the reactive gas in the reaction process is detected. A dissociation quantity value of the reactive gas in the reaction process is calculated. An amount of the reactive gas in the main path after the reaction process is provided. The reactive gas is discharged according to the dissociation quantity value of the reactive gas for removing contaminants in the main path.
Claims14
A device for measuring gas dissociation degrees, comprising:
- a main path for performing processes of plasma-assisted deposition, membrane etching and material surface modification to achieve special functions and effects in semiconductor integrated circuit manufacturing;
- a second path connected to the main path for storing reactive gas;
- a detecting element and an optical spectrum plasma gas dissociation measuring device disposed between the main path and the second path, wherein the detecting element detects a gas dissociation degree and the optical spectrum plasma gas dissociation measuring device calculates a relative dissociation quantity value.
A method for measuring gas dissociation degrees, comprising:
- performing a reaction process with at least one reactive gas in a main path and a second path connecting to the main path for storing the reactive gas;
- detecting a plasma gas dissociation degree of the reactive gas in the reaction process;
- calculating a dissociation quantity value of the reactive gas in the reaction process;
- providing an amount of the reactive gas in the main path after the reaction process according to the dissociation quantity value of the reactive gas;
- and
- discharging the reactive gas for removing contaminants in the main path.
Dependencies are inferred from the claim text.