Y10S 977/854
Semiconductor sample
Y10S977/854 (Semiconductor sample) appears on 72 US grants and 29 published applications in this corpus.
Search patents in Y10S- Granted patents
- 72
- Published applications
- 29
- Assignees
- 46
- Inventors
- 132
- Latest grant
- 27 Aug 2013
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 6 | 0 |
| 1997 | 2 | 0 |
| 1998 | 5 | 0 |
| 1999 | 4 | 0 |
| 2000 | 4 | 0 |
| 2001 | 8 | 1 |
| 2002 | 6 | 5 |
| 2003 | 6 | 5 |
| 2004 | 5 | 4 |
| 2005 | 6 | 4 |
| 2006 | 1 | 1 |
| 2007 | 1 | 1 |
| 2008 | 4 | 1 |
| 2009 | 2 | 3 |
| 2010 | 0 | 3 |
| 2011 | 4 | 0 |
| 2012 | 2 | 0 |
| 2013 | 1 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Quantitative characterization of metallic and semiconductor single-walled carbon nanotube ratios27 Aug 2013US 8,518,711 B2Honda Motor Co., Ltd.
- Methods utilizing scanning probe microscope tips and products thereof or produced thereby29 May 2012US 8,187,673 B2Northwestern University
- Techniques for electrically characterizing tunnel junction film stacks with little or no processing24 Jan 2012US 8,102,174 B2Infineon Technologies North America Corp.
- Method and apparatus for aligning patterns on a substrate25 Oct 2011US 8,043,652 B2NanoInk, Inc.
- Techniques for electrically characterizing tunnel junction film stacks with little or no processing27 Sep 2011US 8,027,185 B2Infineon Technologies North America Corp.
- Quantitative characterization of metallic and semiconductor single-walled carbon nanotube ratios11 Jul 2013US 2013/0180018 A1Honda Motor Co., Ltd.
- Methods utilizing scanning probe microscope tips and products thereof or produced thereby30 Dec 2010US 2010/0330345 A1Northwestern University
- Charged-particle optical system with dual loading options6 May 2010US 2010/0108907 A1FEI Company
- Techniques for Electrically Characterizing Tunnel Junction Film Stacks with Little or no Processing28 Jan 2010US 2010/0023287 A1International Business Machines Corporation
- Techniques for Electrically Characterizing Tunnel Junction Film Stacks with Little or no Processing17 Dec 2009US 2009/0309587 A1International Business Machines Corporation
Most cited
By later US patents
- Method of inspecting planarity of wafer surface after etchback step in integrated circuit fabrication105US 5,420,796 AVLSI Technology, Inc. · 1995
- Methods utilizing scanning probe microscope tips and products therefor or produced thereby90US 6,827,979 B2Northwestern University · 2004
- Method and apparatus for measuring the topography of a semiconductor device57US 5,338,932 AMotorola, Inc. · 1994
- Method for measuring concentration of dopant within a semiconductor substrate57US 5,520,769 AAdvanced Micro Devices, Inc. · 1996
- Method for measuring the electrical potential in a semiconductor element39US 5,723,981 AImec Vzw · 1998