Y10S 148/022
Controlled atmosphere
Y10S148/022 (Controlled atmosphere) appears on 16 US grants and 0 published applications in this corpus.
Search patents in Y10S- Granted patents
- 16
- Published applications
- 0
- Assignees
- 16
- Inventors
- 46
- Latest grant
- 9 Feb 1999
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Annealing magnetic elements for stable mechanical properties9 Feb 1999US 5,870,021 ASensormatic Electronics Corporation
- Method of annealing a semiconductor wafer in a hydrogen atmosphere to desorb surface contaminants16 Apr 1996US 5,508,207 ASumitomo Sitix Corporation
- Low temperature reaction bonding27 Jun 1995US 5,427,638 AAlliedSignal Inc.
- Growth of P type Group III-V compound semiconductor on Group IV semiconductor substrate25 Aug 1992US 5,141,569 AFord Microelectronics, Inc.
- Growth of III-V films by control of MBE growth front stoichiometry10 Mar 1992US 5,094,974 AThe United States of America as represented by the Administrator of the National Aeronautics and Space Administration
No published applications in this class yet.
Most cited
By later US patents
- Low temperature reaction bonding104US 5,427,638 AAlliedSignal Inc. · 1995
- Method for fabricating adjacent conducting and insulating regions in a film by laser irradiation57US 4,339,285 ARCA Corporation · 1982
- Process and apparatus for fabricating a semiconductor device54US 4,477,311 AFujitsu Limited · 1984
- Method of annealing a semiconductor wafer in a hydrogen atmosphere to desorb surface contaminants48US 5,508,207 ASumitomo Sitix Corporation · 1996
- Vacuum system with a secondary gas also connected to the roughing pump for a semiconductor processing chamber36US 5,062,771 AHitachi, Ltd. · 1991