H05H 2242/24
Radiofrequency or microwave generators
H05H2242/24 (Radiofrequency or microwave generators) appears on 58 US grants and 78 published applications in this corpus.
Search patents in H05H- Granted patents
- 58
- Published applications
- 78
- Assignees
- 52
- Inventors
- 174
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2002 | 1 | 3 |
| 2003 | 1 | 0 |
| 2004 | 1 | 0 |
| 2005 | 2 | 0 |
| 2006 | 0 | 2 |
| 2007 | 0 | 0 |
| 2008 | 0 | 1 |
| 2009 | 2 | 1 |
| 2010 | 0 | 1 |
| 2011 | 2 | 0 |
| 2012 | 0 | 3 |
| 2013 | 3 | 4 |
| 2014 | 1 | 4 |
| 2015 | 3 | 2 |
| 2016 | 3 | 6 |
| 2017 | 5 | 4 |
| 2018 | 3 | 2 |
| 2019 | 4 | 4 |
| 2020 | 4 | 1 |
| 2021 | 0 | 1 |
| 2022 | 2 | 6 |
| 2023 | 4 | 8 |
| 2024 | 2 | 5 |
| 2025 | 11 | 10 |
| 2026 | 4 | 10 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Systems and methods for impedance matching in plasma creation at atmospheric pressure11 Aug 2026US 12,706,583 B2Surfx Technologies LLC
- Pulsed ion source28 Jul 2026US 12,696,375 B2Adelphi Technology, Inc.
- Apparatuses and methods involving frequency-selective power amplification10 Mar 2026US 12,573,987 B2The Board of Trustees of the Leland Stanford Junior University
- High-frequency power supply device and output control method therefor3 Mar 2026US 12,567,812 B2Kyosan Electric Mfg. Co., Ltd.
- Matchless plasma source for semiconductor wafer fabrication23 Dec 2025US 12,507,338 B2Lam Research Corporation
- Modulated pulsed microwave waveform in a power source for achieving a desired electron energy distribution in a plasma27 Aug 2026US 2026/0255468 A1Starfire Industries LLC
- Pulsed Ion Source2 Jul 2026US 2026/0190209 A1Adelphi Technology, Inc.
- Matchless plasma source for semiconductor wafer fabrication4 Jun 2026US 2026/0156736 A1Lam Research Corporation
- Matchless plasma source for semiconductor wafer fabrication28 May 2026US 2026/0150176 A1Lam Research Corporation
- Matchless plasma source for semiconductor wafer fabrication30 Apr 2026US 2026/0122752 A1Lam Research Corporation
Most cited
By later US patents
- Tissue treatment method2,025US 6,629,974 B2Gyrus Medical Limited · 2003
- Film forming method and film forming apparatus473US 8,586,484 B2Fuji Electric Co., Ltd. · 2013
- Inert-dominant pulsing in plasma processing systems69US 8,808,561 B2Lam Research Corporation · 2014
- Proactive arc management of a plasma load53US 8,552,665 B2Advanced Energy Industries, Inc. · 2013
- Power system for sterilization systems employing low frequency plasma43US 6,447,719 B1Johnson & Johnson · 2002