Power system for sterilization systems employing low frequency plasma

A method of controllably maintaining a predetermined average power value of a power applied to a plasma within a chamber of a sterilization system, the power having a frequency of from 0 to approximately 200 kHz, the method comprising:

• monitoring a current applied to the plasma within the chamber and generating a first signal indicative of the current;
• monitoring a voltage applied to the plasma within the chamber and generating a second signal indicative of the voltage;
• and
• adjusting the power applied to the plasma in response to the first signal and the second signal to maintain the predetermined average power value of the power applied to the plasma.

A sterilization system comprising:

• a chamber adapted to contain a plasma;
• a plasma generator coupled to the chamber to apply a power to the plasma;
• and
• a power feedback control system comprising:
• a power monitor comprising a current monitor and a voltage monitor, the current monitor adapted to produce a first signal indicative of a current applied to a plasma within the chamber, the voltage monitor adapted to produce a second signal indicative of a voltage applied to the plasma within the chamber, the power monitor adapted to produce a third signal in response to the first signal and the second signal, the third signal indicative of the power applied to the plasma within the chamber;
• a power control module adapted to produce a fourth signal in response to the third signal from the power monitor and to a reference signal corresponding to a predetermined power value;
• and
• a power controller coupled to the plasma generator and adapted to adjust, in response to the fourth signal, the power applied to the plasma to maintain the predetermined power value of the power applied to the plasma.