H01J 49/12
Using an arc discharge
Official title: using an arc discharge, e.g. of the duoplasmatron type
H01J49/12 (Using an arc discharge) appears on 67 US grants and 60 published applications in this corpus.
Search patents in H01J- Granted patents
- 67
- Published applications
- 60
- Assignees
- 46
- Inventors
- 149
- Latest grant
- 10 Dec 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 4 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 0 |
| 2004 | 1 | 0 |
| 2005 | 1 | 1 |
| 2006 | 0 | 1 |
| 2007 | 3 | 4 |
| 2008 | 1 | 1 |
| 2009 | 1 | 1 |
| 2010 | 2 | 0 |
| 2011 | 0 | 1 |
| 2012 | 1 | 2 |
| 2013 | 0 | 1 |
| 2014 | 4 | 5 |
| 2015 | 3 | 1 |
| 2016 | 4 | 5 |
| 2017 | 0 | 5 |
| 2018 | 7 | 5 |
| 2019 | 6 | 6 |
| 2020 | 4 | 3 |
| 2021 | 4 | 8 |
| 2022 | 4 | 6 |
| 2023 | 5 | 1 |
| 2024 | 3 | 1 |
| 2025 | 0 | 1 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry10 Dec 2024US 12,165,863 B2Nova Measuring Instruments Ltd.
- Apparatus and method for preparing glow discharge sputtering samples for material microscopic characterization25 Jun 2024US 12,019,025 B2NCS Testing Technology CO., LTD
- Electrostatic loading of powder samples for ionization27 Feb 2024US 11,913,861 B2Bruker Scientific LLC
- Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry19 Sep 2023US 11,764,050 B2Nova Measuring Instruments Ltd.
- Apparatus and method for thermal assisted desorption ionization systems29 Aug 2023US 11,742,194 B2
- Ion Source21 Aug 2025US 2025/0266255 A1Shimadzu Corporation
- Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry14 Mar 2024US 2024/0087869 A1Nova Measuring Instruments Ltd.
- Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry23 Mar 2023US 2023/0091625 A1Nova Measuring Instruments Ltd.
- A System And Method for Detecting Analytes Dissolved In Liquids By Plasma Ionisation Mass Spectrometry29 Dec 2022US 2022/0415639 A1Microsaic Systems Limited
- Pulsatile Flow Atmospheric Real Time Ionization18 Aug 2022US 2022/0262614 A1Ionsense, Inc.
Most cited
By later US patents
- Plasma ion source mass spectrometer47US 4,948,962 AHitachi, Ltd. · 1990
- Apparatus and method for thermal assisted desorption ionization systems45US 8,754,365 B2Ionsense, Inc. · 2014
- Atmospheric sampling glow discharge ionization source43US 4,849,628 AMartin Marietta Energy Systems, Inc. · 1989
- Ion mobility spectrometer42US 6,690,005 B2General Electric Company · 2004
- Discharge ionization source39US 6,407,382 B1Technispan LLC · 2002