H01J 29/806
Electron lens mosaics
Official title: {Electron lens mosaics, e.g. fly's eye lenses, colour selection lenses}
H01J29/806 (Electron lens mosaics) appears on 8 US grants and 0 published applications in this corpus.
Search patents in H01J- Granted patents
- 8
- Published applications
- 0
- Assignees
- 3
- Inventors
- 7
- Latest grant
- 30 Aug 1988
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 3 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Improved mesh for CRT scan expansion lens and lens fabricated therefrom30 Aug 1988US 4,767,964 ATektronix, Inc.
- Electron beam matrix deflector and method of fabrication30 Jun 1981US 4,276,335 AGeneral Electric Company
- Magnetic fine deflection system comprising sheet conductors23 Sep 1980US 4,224,552 AGeneral Electric Company
- Electron beam matrix deflector manufactured by etching divergent slots8 Jan 1980US 4,182,010 AGeneral Electric Company
- Magnetic deflection apparatus positioned behind target24 Oct 1978US 4,122,369 AGeneral Electric Company
No published applications in this class yet.
Most cited
By later US patents
- Electron beam matrix deflector and method of fabrication9US 4,276,335 AGeneral Electric Company · 1981
- Multi-apertured single plate matrix lens6US 4,070,597 AGeneral Electric Company · 1978
- Improved mesh for CRT scan expansion lens and lens fabricated therefrom5US 4,767,964 ATektronix, Inc. · 1988
- High resolution matrix lens electron optical system4US 4,097,745 AGeneral Electric Company · 1978
- Electron beam matrix deflector manufactured by etching divergent slots4US 4,182,010 AGeneral Electric Company · 1980