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US 4,097,745 AGranted
High resolution matrix lens electron optical system
AssigneeGeneral Electric Company
InventorHarold G. Parks
Life of this patent
Estimating the term…
Abstract
A high resolution matrix lens electron optical system utilizes a relatively short focal length matrix lens, means for providing an axial magnetic field and electrostatic deflection means for both coarse and fine deflection operation in conjunction with the axial magnetic field to provide reduced cathode loading and minimal spherical aberration.
Claims14
An electron optical system for use in deflecting a beam of collimated electrons emitted by source means along an axis of said optical system toward a surface of target means spaced from said source means, comprising:
- electron lens means positioned along said system axis between said source and target means and having an array of a plurality of lenslets each adapted for focussing a beam of electrons impinging thereon substantially to a point at a selected distance beyond said lens means toward said target means;
- first means for forming a magnetic field of substantially constant amplitude essentially along said system axis at least between said lens and target means;
- first deflection means for selectably deflecting said electron beam axially emitted from said source beam to illuminate a selected one of said plurality of said lenslets;
- and
- second deflection means positioned between said lens and target means for relaying and deflecting the focussed beam of electrons to a selected impact site upon said target means surface responsive to the magnitude and polarity of a variable electric field and to said axial magnetic field contained within said second deflection means.
2 more elements
Dependencies are inferred from the claim text.