Electron beam matrix deflector and method of fabrication
AssigneeGeneral Electric Company
InventorCharles Q. Lemmond
Life of this patent
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Abstract
A matrix deflector, for deflecting an electron beam passing therethrough, is fabricated of a pair of members of photosensitive insulating material which are each exposed to a pattern of photons, and then developed to form a pattern of substantially parallel slots through each member; the members are positioned one above the other with the slots thereof orthogonally arrayed. The slots diverge in the direction of electron beam passage through each member to provide an exit aperture wider than the entrance aperture and prevent the deflected beam from striking the edge of the lens member at maximum deflection. The apertures form a set of parallel bars which are coated with a conductive material to facilitate production of deflecting electrostatic fields within each slot.
Claims3
A matrix assembly for deflecting an electron beam, comprising:
- first and second members of insulating material, each of said first and second members having a pair of spaced-apart and opposed end portions and a plurality of substantially parallel slots formed therethrough to define a plurality of bars extending between said spaced, opposed end portions;
- each slot having a cross section through said member substantially continuously diverging in a direction of passage of the electron beam therethrough;
- and
- an electrical conductive coating fabricated upon at least the diverging walls of each adjacent pair of bars defining one of said slots;
- said first and second members being positioned in overlapping parallel planar relationship to one another with the slots thereof mutually orthogonal each to the other and to the direction of passage of said electron-beam therethrough, to define a matrix of apertures.
Dependencies are inferred from the claim text.