G11B 7/266
Sputtering or spin-coating layers
Official title: {Sputtering or spin-coating layers (sputtering in general C23C14/24; spin-coating in general B05D1/005)}
G11B7/266 (Sputtering or spin-coating layers) appears on 356 US grants and 502 published applications in this corpus.
Search patents in G11B- Granted patents
- 356
- Published applications
- 502
- Assignees
- 132
- Inventors
- 742
- Latest grant
- 8 Apr 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 2 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 4 | 0 |
| 1999 | 1 | 0 |
| 2000 | 6 | 0 |
| 2001 | 6 | 11 |
| 2002 | 7 | 11 |
| 2003 | 17 | 29 |
| 2004 | 16 | 54 |
| 2005 | 25 | 66 |
| 2006 | 24 | 60 |
| 2007 | 23 | 40 |
| 2008 | 23 | 44 |
| 2009 | 20 | 34 |
| 2010 | 34 | 55 |
| 2011 | 33 | 30 |
| 2012 | 31 | 18 |
| 2013 | 26 | 12 |
| 2014 | 17 | 8 |
| 2015 | 7 | 7 |
| 2016 | 3 | 3 |
| 2017 | 4 | 4 |
| 2018 | 5 | 2 |
| 2019 | 2 | 3 |
| 2020 | 1 | 4 |
| 2021 | 2 | 4 |
| 2022 | 0 | 0 |
| 2023 | 4 | 0 |
| 2024 | 1 | 3 |
| 2025 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Optical recording medium, manufacturing method thereof, recording material for optical recording medium, and sputtering target for optical recording medium8 Apr 2025US 12,272,393 B2Sony Group Corporation
- Method of producing multilayer optical recording medium and device for producing multilayer optical recording medium15 Oct 2024US 12,119,034 B2Sony Group Corporation
- Sb—Te-based alloy sintered compact sputtering target19 Dec 2023US 11,846,015 B2JX Metals Corporation
- Thin film comprising titanium oxide, and method of producing thin film comprising titanium oxide16 May 2023US 11,651,790 B2JX Nippon Mining & Metals Corporation
- Recording layer for optical data recording medium, optical data recording medium, and sputtering target14 Feb 2023US 11,581,016 B2Kobe Steel, Ltd.
- Sputtering device for multilayer optical recording medium and method for manufacturing multilayer optical recording medium23 May 2024US 2024/0170016 A1Sony Group Corporation
- Method of producing multilayer optical recording medium and device for producing multilayer optical recording medium16 May 2024US 2024/0161779 A1Sony Group Corporation
- Optical recording medium, manufacturing method thereof, recording material for optical recording medium, and sputtering target for optical recording medium22 Feb 2024US 2024/0062781 A1Sony Group Corporation
- Recording layer, optical data recording medium, and sputtering target8 Jul 2021US 2021/0210118 A1Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
- Thin Film Comprising Titanium Oxide, and Method of Producing Thin Film Comprising Titanium Oxide10 Jun 2021US 2021/0174831 A1JX Nippon Mining & Metals Corporation
Most cited
By later US patents
- Sputtering target, method of producing the target, optical recording medium fabricated by using the sputtering target, and method of fabricating the optical recording medium220US 6,280,684 B1Ricoh Company, Ltd. · 2001
- Optical recording media80US 5,498,507 ATDK Corporation · 1996
- Master teaching jig70US 8,406,918 B2WD Media, LLC · 2013
- Information recording medium and its manufacturing method52US 6,554,972 B1Kabushiki Kaisha Toshiba · 2003
- Optical information recording medium, producing method thereof and method of recording/erasing/reproducing information46US 6,153,063 AMatsushita Electric Industrial Co., Ltd. · 2000