Sputtering device for multilayer optical recording medium and method for manufacturing multilayer optical recording medium
AssigneeSony Group Corporation
InventorsMASATSUGU SUWABE, TAKAHIRO IGARI, YOSHIO SHIRAI, TAKEHIRO SATO
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Abstract
Provided is a sputtering device for a multilayer optical recording medium capable of suppressing the occurrence of defects in a recording region. A sputtering device for a multilayer optical recording medium includes an outer mask, wherein the outer mask is configured to be capable of covering an outer periphery of a film-forming surface of an intermediate layer without coming into contact with the film-forming surface.
Claims8
A sputtering device for a multilayer optical recording medium, the sputtering device comprising an outer mask,
- wherein the outer mask is configured to be capable of covering an outer periphery of a film-forming surface of an intermediate layer without coming into contact with the film-forming surface.
A sputtering device for a multilayer optical recording medium, the sputtering device comprising an inner mask,
- wherein the inner mask is configured to be capable of covering an inner periphery of a substrate or a film-forming surface of an intermediate layer and pressing a convex portion without coming into contact with the film-forming surface in a region outside the convex portion provided on the inner periphery of the substrate.
A method for manufacturing a multilayer optical recording medium, the method comprising forming an inorganic layer on a film-forming surface of an intermediate layer by sputtering while covering an outer periphery of the film-forming surface with an outer mask such that the outer mask does not come into contact with the film-forming surface.
Dependencies are inferred from the claim text.