G05B 2219/32139
Select at workstation control parameters for cell, node
G05B2219/32139 (Select at workstation control parameters for cell, node) appears on 2 US grants and 2 published applications in this corpus.
Search patents in G05B- Granted patents
- 2
- Published applications
- 2
- Assignees
- 3
- Inventors
- 9
- Latest grant
- 13 Mar 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 1 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 1 | 0 |
| 2019 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Adjustment apparatus for adjusting processing units provided in a substrate processing apparatus, and a substrate processing apparatus having such an adjustment apparatus13 Mar 2018US 9,915,938 B2Ebara Corporation
- System for controlling an integrated product process for semiconductor wafers and packages11 Oct 1994US 5,355,320 AVLSI Technology, Inc.
- Systems and methods for vehicle manufacturing31 Jan 2019US 2019/0033836 A1GM Global Technology Operations LLC
- Adjustment apparatus for adjusting processing units provided in a substrate processing apparatus, and a substrate processing apparatus having such an adjustment apparatus27 Aug 2015US 2015/0241866 A1Ebara Corporation
Most cited
By later US patents
- System for controlling an integrated product process for semiconductor wafers and packages56US 5,355,320 AVLSI Technology, Inc. · 1994
- Adjustment apparatus for adjusting processing units provided in a substrate processing apparatus, and a substrate processing apparatus having such an adjustment apparatus1US 9,915,938 B2Ebara Corporation · 2018