G03B 27/53
Automatic registration or positioning of originals with respect to each other or
Official title: Automatic registration or positioning of originals with respect to each other or the photosensitive layer
G03B27/53 (Automatic registration or positioning of originals with respect to each other or) appears on 41 US grants and 35 published applications in this corpus.
Search patents in G03B- Granted patents
- 41
- Published applications
- 35
- Assignees
- 21
- Inventors
- 95
- Latest grant
- 19 Oct 2021
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 0 | 2 |
| 2006 | 0 | 0 |
| 2007 | 0 | 4 |
| 2008 | 1 | 4 |
| 2009 | 6 | 2 |
| 2010 | 0 | 1 |
| 2011 | 0 | 3 |
| 2012 | 2 | 7 |
| 2013 | 2 | 2 |
| 2014 | 5 | 3 |
| 2015 | 8 | 1 |
| 2016 | 1 | 1 |
| 2017 | 1 | 0 |
| 2018 | 0 | 2 |
| 2019 | 1 | 1 |
| 2020 | 0 | 1 |
| 2021 | 2 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Automatic microform carrier systems and methods19 Oct 2021US 11,150,544 B2e-ImageData Corp.
- Method and exposure device for exposing at least one stored representation on a light-sensitive recording medium8 Jun 2021US 11,029,608 B2
- Exposure method7 May 2019US 10,281,828 B2Kabushiki Kaisha Tokai Rika Denki Seisakusho
- Positioning system, a lithographic apparatus and a method for positional control6 Jun 2017US 9,671,702 B2ASML Netherlands B. V.
- Positioning system, a lithographic apparatus and a method for positional control5 Jan 2016US 9,229,339 B2ASML Netherlands B. V.
- Method and exposure device for exposing at least one stored representation on a light-sensitive recording medium6 Aug 2020US 2020/0249579 A1MIVA Technologies Gmbh
- Automatic microform carrier systems and methods24 Oct 2019US 2019/0324354 A1e-lmageData Corp.
- Digital microform imaging apparatus27 Dec 2018US 2018/0372989 A1e-ImageData Corp.
- Exposure method22 Nov 2018US 2018/0335688 A1Kabushiki Kaisha Tokai Rika Denki Seisakusho
- Positioning system, a lithographic apparatus and a method for positional control17 Mar 2016US 2016/0077450 A1ASML Netherlands B. V.
Most cited
By later US patents
- Method and system for exposing a photoresist in a magnetic device147US 8,169,473 B1Western Digital (Fremont), LLC · 2012
- Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method99US 7,483,120 B2ASML Netherlands B. V. · 2009
- Exposure apparatus, exposure method, and method of manufacturing device13US 8,625,072 B2Canon Kabushiki Kaisha · 2014
- Lithographic apparatus and device manufacturing method11US 7,385,675 B2ASML Netherlands B. V. · 2008
- Method of reducing a wave front aberration, and computer program product11US 7,580,113 B2ASML Netherlands B. V. · 2009