Positioning system, a lithographic apparatus and a method for positional control
AssigneeASML Netherlands B.V.
InventorsHans Butler, Henrikus Herman Marie Cox
Life of this patent
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Abstract
A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.
Claims9
A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system comprising:
- a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate;
- and
- a controller configured to control movement of the other component in a control coordinate based on the determined error;
- wherein the measurement coordinate is different from the control coordinate, and
- wherein the measurement coordinate is associated with a first direction or a first rotational direction and the control coordinate is associated with a second direction or a second rotational direction that is different from the first direction or the first rotational direction.
A method for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the method comprising:
- determining an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate;
- and
- controlling movement of the other component in a control coordinate based on the determined error;
- wherein the measurement coordinate is different from the control coordinate, and
- wherein the measurement coordinate is associated with a first direction or a first rotational direction and the control coordinate is associated with a second direction or a second rotational direction that is different from the first direction or the first rotational direction.
Dependencies are inferred from the claim text.