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US 10,281,828 B2Granted
Exposure method
AssigneeKabushiki Kaisha Tokai Rika Denki Seisakusho
InventorKento Arimatsu
Life of this patent
Estimating the term…
Abstract
An exposure method includes, in a case of exposing unmeasurable shots which are arranged linearly and whose focus value cannot be measured and a measurable shot which is adjacent to the unmeasurable shots and whose focus value can be measured, exposing alternately the measurable shot and the unmeasurable shots such that the unmeasurable shots are exposed using the focus value of the adjacent measurable shot exposed immediately before the unmeasurable shots.
Claims7
An exposure method, comprising,
- in a case of exposing unmeasurable shots, which are arranged linearly and whose focus value cannot be measured, and a measurable shot, which is adjacent to the unmeasurable shots and whose focus value can be measured,
- exposing the measurable shot between the exposure of the unmeasurable shots such that the unmeasurable shots are exposed using the focus value of the adjacent measurable shot exposed immediately before the unmeasurable shots.
An exposure method, comprising:
- repeating measurement of a focus value and exposure using the focus value based on a first exposure pattern of predetermined exposure patterns that has a linear exposure path;
- and
- exposing, based on a second exposure pattern of the predetermined exposure patterns that has a zig-zag exposure path, alternately measurable shots and unmeasurable shots by exposing the unmeasurable shots whose focus value cannot be measured consecutively in a linear direction by using focus values of the measurable shots that are adjacent to the unmeasurable shots and exposed immediately before the unmeasurable shots that are to be exposed.
Dependencies are inferred from the claim text.