G02B 27/0043
In projection exposure systems
Official title: {in projection exposure systems, e.g. microlithographic systems}
G02B27/0043 (In projection exposure systems) appears on 91 US grants and 95 published applications in this corpus.
Search patents in G02B- Granted patents
- 91
- Published applications
- 95
- Assignees
- 38
- Inventors
- 186
- Latest grant
- 23 Apr 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 3 | 3 |
| 2002 | 4 | 5 |
| 2003 | 4 | 5 |
| 2004 | 4 | 12 |
| 2005 | 6 | 11 |
| 2006 | 13 | 11 |
| 2007 | 9 | 8 |
| 2008 | 4 | 6 |
| 2009 | 2 | 4 |
| 2010 | 6 | 1 |
| 2011 | 1 | 4 |
| 2012 | 1 | 1 |
| 2013 | 2 | 2 |
| 2014 | 2 | 1 |
| 2015 | 1 | 1 |
| 2016 | 2 | 1 |
| 2017 | 3 | 2 |
| 2018 | 3 | 3 |
| 2019 | 4 | 7 |
| 2020 | 5 | 0 |
| 2021 | 2 | 2 |
| 2022 | 2 | 1 |
| 2023 | 1 | 1 |
| 2024 | 1 | 0 |
| 2025 | 0 | 2 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Imaging optical system, exposure apparatus, and article manufacturing method23 Apr 2024US 11,966,043 B2Canon Kabushiki Kaisha
- Measuring device with measurement beam homogenization18 Jul 2023US 11,703,591 B2Leica Geosystems AG
- Folded projection system25 Oct 2022US 11,480,808 B2Apple Inc.
- Method for correcting an image, storage medium and projection device29 Mar 2022US 11,287,646 B2Xi'an Zhongxing New Software Co., Ltd.
- Method and device for determining the heating state of a mirror in an optical system26 Oct 2021US 11,156,922 B2Carl Zeiss SMT GmbH
- An illumination module for a metrology device26 Mar 2026US 2026/0086380 A1ASML Netherlands B. V.
- Method for heating an optical element, and optical system27 Mar 2025US 2025/0102920 A1
- Optical element, and assembly and optical system therewith27 Feb 2025US 2025/0068089 A1
- Eye Glow Suppression in Waveguide Based Displays6 Jul 2023US 2023/0213767 A1DigiLens Inc.
- Imaging optical system, exposure apparatus, and article manufacturing method13 Jan 2022US 2022/0011571 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Pattern generator using EUV240US 6,687,041 B1Micronic Laser Systems AB · 2004
- Pattern generator236US 6,747,783 B1Micronic Laser Systems AB · 2004
- Pattern generator for avoiding stitching errors134US 6,285,488 B1Micronic Laser Systems AB · 2001
- Modulator design for pattern generator67US 6,504,644 B1Micronic Laser Systems AB · 2003
- Projection lens system52US 5,170,207 AOlympus Optical Co., Ltd. · 1992