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G01N 2021/95676

Masks, reticles, shadow masks

Official title: {Masks, reticles, shadow masks}

G01N2021/95676 (Masks, reticles, shadow masks) appears on 498 US grants and 560 published applications in this corpus.

Search patents in G01N

Granted patents: 498
Published applications: 560
Assignees: 152
Inventors: 1,099
Latest grant: 28 Jul 2026

Filings by year

G01N 2021/95676: granted patents and published applications per publication year
Year	Granted patents	Published applications
1989	2	0
1990	6	0
1991	2	0
1992	2	0
1993	1	0
1994	1	0
1995	1	0
1996	3	0
1997	0	0
1998	4	0
1999	2	0
2000	2	0
2001	3	0
2002	2	6
2003	10	8
2004	6	9
2005	10	17
2006	13	18
2007	12	23
2008	18	24
2009	11	19
2010	23	24
2011	23	22
2012	20	19
2013	14	24
2014	22	31
2015	29	31
2016	28	31
2017	35	28
2018	19	27
2019	38	26
2020	26	24
2021	23	24
2022	19	23
2023	19	28
2024	19	14
2025	20	27
2026	10	33

By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.

Recent patents

Light source apparatus, inspection apparatus, exposure apparatus, light source control method, inspection method, and exposure method28 Jul 2026US 12,693,232 B2Lasertec Corporation
Method and apparatus for characterization of a microlithography mask28 Jul 2026US 12,693,594 B2Carl Zeiss SMT GmbH
Probe and inspection apparatus including the same21 Jul 2026US 12,687,489 B2Samsung Electronics Co., Ltd.
System and method for inspecting a mask for EUV lithography30 Jun 2026US 12,669,446 B2Carl Zeiss SMT GmbH
Method and system to for rapid inspection of photolithography reticle23 Jun 2026US 12,663,711 B2Taiwan Semiconductor Manufacturing Company.Ltd

Most cited

By later US patents