C08F 120/24
Containing perhaloalkyl radicals
Official title: containing perhaloalkyl radicals
C08F120/24 (Containing perhaloalkyl radicals) appears on 22 US grants and 31 published applications in this corpus.
Search patents in C08F- Granted patents
- 22
- Published applications
- 31
- Assignees
- 23
- Inventors
- 91
- Latest grant
- 19 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 1 |
| 2003 | 1 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 1 |
| 2008 | 0 | 0 |
| 2009 | 1 | 2 |
| 2010 | 0 | 1 |
| 2011 | 1 | 0 |
| 2012 | 2 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 2 |
| 2015 | 0 | 1 |
| 2016 | 1 | 2 |
| 2017 | 1 | 4 |
| 2018 | 2 | 0 |
| 2019 | 1 | 4 |
| 2020 | 1 | 4 |
| 2021 | 2 | 3 |
| 2022 | 2 | 2 |
| 2023 | 2 | 2 |
| 2024 | 2 | 1 |
| 2025 | 0 | 1 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for forming photoresist patterns19 May 2026US 12,631,966 B2Samsung Electronics Co., Ltd.
- Compositions and articles including perfluoropolyether bottlebrush polymers and methods of making and using same21 Apr 2026US 12,606,661 B2Donaldson Company, Inc.
- Salt, acid generator, resist composition and method for producing resist pattern24 Dec 2024US 12,174,537 B2Sumitomo Chemical Company, Limited
- Functional polymer2 Apr 2024US 11,945,898 B2Susos AG
- Fluorine-containing polycaprolactone film and preparation method therefor7 Nov 2023US 11,807,728 B2Soochow University
- Electrochemical biosensor comprising transition metal complex or oxidation-reduction polymer31 Jul 2025US 2025/0244282 A1I-Sens, Inc.
- Metal-containing polymers for mass cytometry3 Oct 2024US 2024/0327549 A1Standard BioTools Canada Inc.
- Method for forming photoresist patterns2 Feb 2023US 2023/0032354 A1Samsung Electronics Co., Ltd.
- Method for forming photoresist patterns26 Jan 2023US 2023/0026579 A1Samsung Electronics Co., Ltd.
- Compositions and articles including perfluoropolyether bottlebrush polymers and methods of making and using same4 Aug 2022US 2022/0243010 A1Donaldson Company, Inc.
Most cited
By later US patents
- Degradable, amorphous, fluorochemical acrylate polymers14US 6,649,719 B23M Innovative Properties Company · 2003
- Method for anionic homopolymerization of .alpha.-trifluoromethylacrylate12US 4,613,657 ACentral Glass Company, Limited · 1986
- Process for preparing long-chain polymethylene halide telomers5US 7,893,186 B23M Innovative Properties Company · 2011
- Fluorocarbon polymer coatings prepared by living polymerization2US 9,421,574 B2Aculon, Inc. · 2016
- Low refractive index coating for optical fibers, methods of manufacture thereof and articles comprising the same1US 10,035,915 B2OFS Fitel, LLC · 2018