Salt, acid generator, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro Masuyama, Satoshi Yamamoto, Koji Ichikawa
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AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro Masuyama, Satoshi Yamamoto, Koji Ichikawa
Estimating the term…
Disclosed is a salt represented by formula (I): wherein, in formula (I), Q1 and Q2 each independently represent a fluorine atom or the like, R1 and R2 each independently represent a hydrogen atom or the like, zi represents an integer of 0 to 6, and when zi is 2 or more, a plurality of R1 and R2 may be the same or different from each other, X1 represents *—CO—O—, *—O—CO— or the like (* represents a bonding site to C(R1)(R2) or C(Q1)(Q2)), L1 represents a single bond or a divalent saturated hydrocarbon group having 1 to 28 carbon atoms or the like, R3 and R4 each independently represent a cyclic hydrocarbon group having 3 to 18 carbon atoms which may have a substituent or the like, and Z+ represents an organic cation.
A resist composition comprising
Dependencies are inferred from the claim text.