C07C 69/753
Of polycyclic acids
Official title: of polycyclic acids
C07C69/753 (Of polycyclic acids) appears on 276 US grants and 235 published applications in this corpus.
Search patents in C07C- Granted patents
- 276
- Published applications
- 235
- Assignees
- 163
- Inventors
- 727
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 3 | 0 |
| 1981 | 0 | 0 |
| 1982 | 3 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 6 | 0 |
| 1994 | 3 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 6 | 0 |
| 1998 | 7 | 0 |
| 1999 | 9 | 0 |
| 2000 | 10 | 0 |
| 2001 | 14 | 2 |
| 2002 | 11 | 11 |
| 2003 | 12 | 13 |
| 2004 | 6 | 12 |
| 2005 | 5 | 10 |
| 2006 | 10 | 9 |
| 2007 | 4 | 4 |
| 2008 | 4 | 9 |
| 2009 | 8 | 6 |
| 2010 | 9 | 7 |
| 2011 | 4 | 11 |
| 2012 | 6 | 10 |
| 2013 | 9 | 16 |
| 2014 | 17 | 10 |
| 2015 | 12 | 11 |
| 2016 | 10 | 15 |
| 2017 | 13 | 15 |
| 2018 | 18 | 13 |
| 2019 | 8 | 9 |
| 2020 | 4 | 6 |
| 2021 | 10 | 11 |
| 2022 | 3 | 5 |
| 2023 | 7 | 4 |
| 2024 | 4 | 8 |
| 2025 | 1 | 2 |
| 2026 | 3 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Monomer isomerization and polymer fluorination for sustainable depolymerizable polymers6 Oct 2026US 12,753,252 B2The University of Akron
- Alpha-carbonyl alkenyl ester preparation method therefor and application thereof15 Sep 2026US 12,735,449 B2Jiangxi Normal University
- Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound24 Feb 2026US 12,560,866 B2Jsr Corporation
- Onium salt, chemically amplified resist composition and patterning process4 Mar 2025US 12,240,804 B2Shin-Etsu Chemical Co., Ltd.
- Method for manufacturing cyclopropane compound24 Sep 2024US 12,098,137 B2Sumitomo Chemical Company, Limited
- Compound, polymerizable composition, cured product, optical film, polarizing plate, and image display device20 Aug 2026US 2026/0243940 A1FUJIFILM Corporation
- Resist composition, resist pattern formation method, compound, and acid diffusion control agent16 Jul 2026US 2026/0202743 A1Tokyo Ohka Kogyo.Co., Ltd.
- Fullerene derivative composition and photovoltaic conversion element9 Jul 2026US 2026/0193164 A1Mitsubishi Corporation
- Fragrance and flavor compositions comprising norbornane and norbornene derivatives19 Mar 2026US 2026/0078079 A1Osmo Labs, PBC
- Dimethylbicycloheptenyl and dimethylbicycloheptanyl derivatives and their use as odorants19 Mar 2026US 2026/0078080 A1Givaudan SA
Most cited
By later US patents
- Acid-decomposable ester compound suitable for use in resist material109US 6,448,420 B1Shin-Etsu Chemical Co., Ltd. · 2002
- Ester compounds, polymers, resist composition and patterning process62US 6,147,249 AShin-Etsu Chemical Co., Ltd. · 2000
- Achiral fluorine-containing liquid crystals56US 5,082,587 A1992
- Prostacyclin compounds, compositions and methods of use thereof48US 9,255,064 B2Insmed Incorporated · 2016
- Polyhaloalkyl ether derivatives as well as liquid crystal compositions and liquid crystal display elements containing them44US 6,007,740 AChisso Corporation · 1999