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US 6,147,249 AGranted
Ester compounds, polymers, resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTakeru Watanabe, Takeshi Kinsho, Tsunehiro Nishi, Mutsuo Nakashima, Koji Hasegawa, Jun Hatakeyama
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Abstract
A novel ester compound having an alkylcycloalkyl or alkylcycloalkenyl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
Claims20
An ester compound of the following general formula ##STR33## wherein R.sup.1 is hydrogen, methyl or CH.sub.2 CO.sub.2 R.sup.4 ;
- R.sup.2 is hydrogen, methyl or CO.sub.2 R.sup.4 ;
- R.sup.3 is a straight, branched or cyclic alkyl group of 1 to 8 carbon atoms or a substituted or unsubstituted aryl group of 6 to 20 carbon atoms;
- R.sup.4 is a straight, branched or cyclic alkyl group of 1 to 15 carbon atoms;
- k is equal to 0 or 1, m is equal to 0 or 1, n is equal to 0, 1, 2 or 3, and 2m+n is equal to 2 or 3.
1 more element
Dependencies are inferred from the claim text.