C07C 313/24
Having sulfur atoms of sulfenamide groups bound to carbon atoms of six-membered
Official title: having sulfur atoms of sulfenamide groups bound to carbon atoms of six-membered aromatic rings
C07C313/24 (Having sulfur atoms of sulfenamide groups bound to carbon atoms of six-membered) appears on 3 US grants and 4 published applications in this corpus.
Search patents in C07C- Granted patents
- 3
- Published applications
- 4
- Assignees
- 6
- Inventors
- 25
- Latest grant
- 22 Dec 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 1 |
| 2015 | 2 | 1 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Chiral 2-arylpropyl-2-sulfinamide and chiral N-2-arylpropyl-2-sulfinylimines and synthesis thereof22 Dec 2015US 9,216,953 B2
- Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same17 Nov 2015US 9,188,862 B2FUJIFILM Corporation
- Herbicidal diphenyl ethers and their use for controlling undesirable plant growth27 Aug 1985US 4,537,621 ABASF SE
- Novel compound for capping layer and organic light emitting device including same22 Aug 2024US 2024/0279158 A1Dongjin Semichem Co., Ltd.
- Chiral 2-arylpropyl-2-sulfinamide and chiral n-2-arylpropyl-2-sulfinylimines and synthesis thereof1 Oct 2015US 2015/0274654 A1Nanjing University
- Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same2 Oct 2014US 2014/0295332 A1FUJIFILM Corporation
- Antibacterial agents26 May 2005US 2005/0113450 A1
Most cited
By later US patents
No patent in this class has been cited by a later US patent yet.