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US 2014/0295332 A1Published application
Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
AssigneeFUJIFILM Corporation
InventorsShuji HIRANO, Hiroo TAKIZAWA, Hideaki TSUBAKI
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Abstract
An actinic ray-sensitive or radiation-sensitive resin composition, which is excellent in sensitivity, resolution, a pattern profile and a depth of focus (DOF), and, an actinic ray-sensitive or radiation-sensitive film and a pattern forming method, each using the same, are provided. The actinic ray-sensitive or radiation-sensitive resin composition includes a nitrogen-containing compound and a resin (Ab) capable of varying a polarity or an alkali solubility thereof by the action of an acid.
Claims17
An actinic ray-sensitive or radiation-sensitive resin composition comprising:
- a nitrogen-containing compound, and
- a resin (Ab) capable of varying a polarity thereof by the action of an acid,
- wherein the nitrogen-containing compound is a compound having at least one amino group formed by bonding one or two hydrogen atoms to a nitrogen atom, and
- at least one hydrogen atom of said one or two hydrogen atoms is substituted by an —S—R3 group or an —S(O)R3 group, wherein R3 represents a substituent.
1 more element
Dependencies are inferred from the claim text.