Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• a nitrogen-containing compound, and
• a resin (Ab) capable of varying a polarity thereof by the action of an acid,
• wherein the nitrogen-containing compound is a compound having at least one amino group formed by bonding one or two hydrogen atoms to a nitrogen atom, and
• at least one hydrogen atom of the one or two hydrogen atoms is substituted by an —S—R3 group or an —S(O)R3 group,
• wherein R3 is selected from the group consisting of an alkyl group, a cycloalkyl group, an alkoxy group, an acyl group, an acyloxy group, a halogen atom, a cyano group, a silicon atom-containing organic group, an aryl group, an aryloxy group, an aralkyl group, an aralkyloxy group, a hydroxy group, a nitro group, a sulfonylamino group, an alkylthio group, an arylthio group, and an aralkylthio group.