C07C 309/71
Having sulfur atoms of esterified sulfo groups bound to carbon atoms of
Official title: having sulfur atoms of esterified sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings
C07C309/71 (Having sulfur atoms of esterified sulfo groups bound to carbon atoms of) appears on 21 US grants and 10 published applications in this corpus.
Search patents in C07C- Granted patents
- 21
- Published applications
- 10
- Assignees
- 15
- Inventors
- 56
- Latest grant
- 26 Mar 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 3 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 1 |
| 2011 | 1 | 0 |
| 2012 | 0 | 1 |
| 2013 | 1 | 2 |
| 2014 | 0 | 1 |
| 2015 | 1 | 0 |
| 2016 | 2 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 1 |
| 2019 | 0 | 0 |
| 2020 | 1 | 1 |
| 2021 | 1 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 0 |
| 2024 | 1 | 1 |
| 2025 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Molecular resist composition and patterning process26 Mar 2024US 11,940,728 B2Shin-Etsu Chemical Co., Ltd.
- Pretreatment solution for inkjet recording, inkjet recording apparatus, and image forming method2 Feb 2021US 10,906,332 B2KYOCERA Document Solutions Inc.
- Atropisomers and methods of altering enantiomeric excess10 Mar 2020US 10,584,077 B2The Florida State University Research Foundation, Inc.
- Chiral synthesis of N-{3,4-difluoro-2-[(2-fluoro-4-iodophenyl)amino]-6-methoxyphenyl}-1-[2,3-dihydroxy-propyl]cyclopropanesulfonamides3 May 2016US 9,328,066 B2Bayer Intellectual Property GmbH
- Preparation of norbornane-based PAC ballasts16 Feb 2016US 9,261,781 B2Sumitomo Bakelite Co., Ltd.
- Onium salt, chemically amplified resist composition, and patterning process4 Sep 2025US 2025/0276954 A1Shin-Etsu Chemical Co., Ltd.
- Photoacid generator, photoresist composition and method for forming photoresist pattern using the same10 Oct 2024US 2024/0337929 A1Dongjin Semichem Co., Ltd.
- Molecular resist composition and patterning process31 Mar 2022US 2022/0100089 A1Shin-Etsu Chemical Co., Ltd.
- Pretreatment solution for inkjet recording, inkjet recording apparatus, and image forming method23 Jan 2020US 2020/0024470 A1KYOCERA Document Solutions Inc.
- Atropisomers and Methods of Altering Enantiomeric Excess28 Jun 2018US 2018/0179120 A1The Florida State University Research Foundation, Inc.
Most cited
By later US patents
- Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process50US 6,440,634 B1Shin-Etsu Chemical Co., Ltd. · 2002
- Positive photoresist composition utilizing O-quinonediazide and novolak resin10US 5,089,373 AFuji Photo Film Co., Ltd. · 1992
- Positive resist composition and photosensitizers8US 5,866,724 ASumitomo Chemical Company, Limited · 1999
- Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives7US 5,308,744 AMorton International, Inc. · 1994
- Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition3US 9,223,208 B2FUJIFILM Corporation · 2015