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US 9,223,208 B2Granted
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
AssigneeFUJIFILM Corporation
InventorsTomotaka Tsuchimura, Takayuki Ito
Life of this patent
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Abstract
An actinic ray- or radiation-sensitive resin composition according to the present invention comprises a sulfonic acid-generating compound that is decomposed by an action of an acid to generate a sulfonic acid having a volume of 240 Å3 or more and a compound that generates the acid when exposed to actinic rays or radiation.
Claims15
An actinic ray- or radiation-sensitive resin composition comprising:
- a sulfonic acid-generating compound that is decomposed by an action of an acid to generate a sulfonic acid having a volume of 240 Å3 or more;
- a compound that generates the acid when exposed to actinic rays or radiation;
- and
- further comprising a resin that is decomposed by an action of the acid to increase its solubility in an alkaline developer,
- wherein
- the sulfonic acid-generating compound is any of compounds of general formulae (1) to (5) below and the sulfonic acid is represented by a formula A-SO3H,
- where
- each of R1 to R4, R7 to R13 and R15 to R19 represents a hydrogen atom or a monovalent substituent,
- each of R5, R6 and R14 represents a monovalent substituent, and
- A in the formula A-SO3H represents a residue of the sulfonic acid,
- and wherein,
- the sulfonic acid represented by the formula A-SO3H is a compound of the following general formula (6),
- in which
- Ar represents an aryl group, in which a substituent other than the -(D-B) group may further be introduced,
- n is an integer of 1 or greater,
- D represents a single bond or a bivalent connecting group, and
- B represents a hydrocarbon group.
14 more elements
An actinic ray- or radiation-sensitive resin composition comprising:
- a sulfonic acid-generating compound that is decomposed by an action of an acid to generate a sulfonic acid having a volume of 240 Å3 or more;
- a compound that generates the acid when exposed to actinic rays or radiation;
- and
- further comprising a resin soluble in an alkaline developer and an acid crosslinking agent capable of crosslinking with the resin by an action of the acid,
- wherein
- the sulfonic acid-generating compound is any of compounds of general formulae (1) to (5) below and the sulfonic acid is represented by a formula A-SO3H,
- where
- each of R1 to R4, R7 to R13 and R15 to R19 represents a hydrogen atom or a monovalent substituent,
- each of R5, R6 and R14 represents a monovalent substituent, and
- A in the formula A-SO3H represents a residue of the sulfonic acid,
- and wherein
- the sulfonic acid represented by the formula A-SO3H is a compound of the following general formula (6),
- in which
- Ar represents an aryl group, in which a substituent other than the -(D-B) group may further be introduced,
- n is an integer of 1 or greater,
- D represents a single bond or a bivalent connecting group, and
- B represents a hydrocarbon group.
14 more elements
An actinic ray- or radiation-sensitive resin composition comprising:
- a sulfonic acid-generating compound that is decomposed by an action of an acid to generate a sulfonic acid having a volume of 240 Å3 or more;
- a compound that generates the acid when exposed to actinic rays or radiation;
- and
- further comprising a resin that is decomposed by an action of the acid to increase its solubility in an alkaline developer,
- wherein
- the sulfonic acid-generating compound is any of compounds of general formulae (1) to (5) below and the sulfonic acid is represented by a formula A-SO3H
- where
- each of R1 to R4, R7 to R13 and R15 to R19 represents a hydrogen atom or a monovalent substituent,
- each of R5, R6 and R14 represents a monovalent substituent, and
- A in the formula A-SO3H represents a residue of the sulfonic acid,
- and wherein
- the sulfonic acid represented by the formula A-SO3H is a compound of the following general formula (7),
- in which
- each of Xf's independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom,
- each of R1 and R2 independently represents a group selected from the group consisting of a hydrogen atom, a fluorine atom, an alkyl group and an alkyl group substituted with at least one fluorine atom, provided that a plurality of R1s or R2s may be identical to or different from each other,
- L represents a single bond or a bivalent connecting group, provided that a plurality of L's may be identical to or different from each other,
- E represents a group with a cyclic structure,
- x is an integer of 1 to 20,
- y is an integer of 0 to 10, and
- z is an integer of 0 to 10.
17 more elements
An actinic ray- or radiation-sensitive resin composition comprising:
- a sulfonic acid-generating compound that is decomposed by an action of an acid to generate a sulfonic acid having a volume of 240 Å3 or more;
- a compound that generates the acid when exposed to actinic rays or radiation;
- and
- further comprising a resin soluble in an alkaline developer and an acid crosslinking agent capable of crosslinking with the resin by an action of the acid,
- wherein
- the sulfonic acid-generating compound is any of compounds of general formulae (1) to (5) below and the sulfonic acid is represented by a formula A-SO3H
- where
- each of R1 to R4, R7 to R13 and R15 to R19 represents a hydrogen atom or a monovalent substituent,
- each of R5, R6 and R14 represents a monovalent substituent, and
- A in the formula A-SO3H represents a residue of the sulfonic acid,
- and wherein
- the sulfonic acid represented by the formula A-SO3H is a compound of the following general formula (7),
- in which
- each of Xf's independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom,
- each of R1 and R2 independently represents a group selected from the group consisting of a hydrogen atom, a fluorine atom, an alkyl group and an alkyl group substituted with at least one fluorine atom, provided that a plurality of R1s or R2s may be identical to or different from each other,
- L represents a single bond or a bivalent connecting group, provided that a plurality of L's may be identical to or different from each other,
- E represents a group with a cyclic structure,
- x is an integer of 1 to 20,
- y is an integer of 0 to 10, and
- z is an integer of 0 to 10.
17 more elements
Dependencies are inferred from the claim text.