B24B 49/12
Involving optical means
Official title: involving optical means
B24B49/12 (Involving optical means) appears on 1,230 US grants and 1,324 published applications in this corpus.
Search patents in B24B- Granted patents
- 1,230
- Published applications
- 1,324
- Assignees
- 467
- Inventors
- 2,387
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 4 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 4 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 3 | 0 |
| 1996 | 6 | 0 |
| 1997 | 20 | 0 |
| 1998 | 21 | 0 |
| 1999 | 20 | 0 |
| 2000 | 49 | 0 |
| 2001 | 63 | 34 |
| 2002 | 59 | 49 |
| 2003 | 74 | 69 |
| 2004 | 54 | 51 |
| 2005 | 56 | 41 |
| 2006 | 61 | 44 |
| 2007 | 34 | 35 |
| 2008 | 20 | 31 |
| 2009 | 28 | 27 |
| 2010 | 21 | 46 |
| 2011 | 21 | 32 |
| 2012 | 21 | 41 |
| 2013 | 41 | 43 |
| 2014 | 42 | 54 |
| 2015 | 35 | 67 |
| 2016 | 49 | 34 |
| 2017 | 36 | 40 |
| 2018 | 42 | 48 |
| 2019 | 37 | 67 |
| 2020 | 29 | 55 |
| 2021 | 22 | 53 |
| 2022 | 30 | 71 |
| 2023 | 71 | 72 |
| 2024 | 55 | 97 |
| 2025 | 51 | 70 |
| 2026 | 40 | 53 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- System and method for controlling chemical mechanical planarization29 Sep 2026US 12,751,254 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Slurry monitoring device, CMP system and method of in-line monitoring a slurry8 Sep 2026US 12,728,498 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Monitoring system for a movable component connected to a stationary component1 Sep 2026US 12,722,249 B2Marposs Societa' Per Azioni
- Processing machine, control device for processing machine and control method for processing machine25 Aug 2026US 12,715,081 B2Komatsu Ltd.
- Slurry recycling for chemical mechanical polishing system25 Aug 2026US 12,721,077 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Slurry monitoring device, cmp system and method of in-line monitoring a slurry8 Oct 2026US 2026/0307205 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Polishing method, polishing monitoring method and polishing monitoring apparatus for workpiece1 Oct 2026US 2026/0295767 A1Ebara Corporation
- Polishing method, polishing monitoring method and polishing monitoring apparatus for workpiece24 Sep 2026US 2026/0284826 A1Ebara Corporation
- Polishing method, polishing monitoring method and polishing monitoring apparatus for workpiece24 Sep 2026US 2026/0284827 A1Ebara Corporation
- Method and System for Automated Surface Treatment24 Sep 2026US 2026/0284830 A1Palladyne Corp.
Most cited
By later US patents
- Industrial endoscope system having a rotary treatment member1,407US 5,155,941 AOlympus Optical Co., Ltd. · 1992
- Indirect endpoint detection by chemical reaction and chemiluminescence486US 6,126,848 AInternational Business Machines Corporation · 2000
- Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus396US 5,893,796 AAPPLIED Materials.Inc. · 1999
- Method and apparatus for mechanical planarization and endpoint detection of a semiconductor wafer332US 5,081,796 AMicron Technology, Inc. · 1992
- System and method for real-time control of semiconductor a wafer polishing, and a polishing head316US 5,486,129 AMicron Technology, Inc. · 1996