LFE Corporation
Clinton, MA, US· latest recorded location
LFE Corporation is named on 15 US grants and 0 published applications in this corpus. Its most frequent classification is H10P (Generic processes or apparatus for the manufacture or treatment of devices covered).
- Granted patents
- 15
- Published applications
- 0
- Inventors
- 9
- Granted in 2026 so far
- 0
- Most recent grant
- 23 May 1989
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 3 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
By publication year.
Technology areas
Share of 15 documents
- H10PGeneric processes or apparatus for the manufacture or treatment of devices covered7
- G03FPhotomechanical production of textured or patterned surfaces3
- C23CCoating metallic material2
- C23FNon-mechanical removal of metallic material from surface2
- B01JChemical or physical processes1
- F04BPositive-displacement machines for liquids1
- G01DMeasuring not specially adapted for a specific variable1
- G01FMeasuring volume, volume flow, mass flow or liquid level1
- G01NInvestigating or analysing materials by determining their chemical or physical properties1
- G01RMeasuring electric variables1
Recent patents
- Process and material for manufacturing semiconductor devices23 May 1989US RE32,928 E
- Automatically loadable multifaceted electrode with load lock mechanism2 Jul 1985US 4,526,670 A
- Plasma reactive ion etching of aluminum and aluminum alloys19 Mar 1985US 4,505,782 A
- Automatic lock for two mode piston pump12 Feb 1985US 4,498,354 A
- Gas discharge apparatus7 Dec 1982US 4,362,632 A
No published applications.
Most cited
By later US patents
- Gas discharge apparatus135US 4,362,632 A1982
- Clamp-on ultrasonic transducer54US 4,286,470 A1981
- Process and material for manufacturing thin film integrated circuits41US 4,028,155 A1977
- Selective plasma polysilicon etching40US 4,353,777 A1982
- Process and material for semiconductor photomask fabrication37US 3,951,709 A1976