Crestec Corporation
Tokyo, JP· latest recorded location
Crestec Corporation is named on 5 US grants and 5 published applications in this corpus. Its most frequent classification is H01J (Electric discharge tubes or discharge lamps).
- Granted patents
- 5
- Published applications
- 5
- Inventors
- 9
- Granted in 2026 so far
- 0
- Most recent grant
- 31 Jul 2012
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2005 | 0 | 1 |
| 2006 | 1 | 0 |
| 2007 | 0 | 1 |
| 2008 | 0 | 0 |
| 2009 | 1 | 1 |
| 2010 | 0 | 2 |
| 2011 | 1 | 0 |
| 2012 | 2 | 0 |
By publication year.
Technology areas
Share of 10 documents
Recent patents
- Surface emission type electron source and drawing device31 Jul 2012US 8,232,711 B2
- Aberration evaluation pattern, aberration evaluation method, aberration correction method, electron beam drawing apparatus, electron microscope, master, stamper, recording medium, and structure17 Apr 2012US 8,158,310 B2
- Electron beam applying apparatus and drawing apparatus19 Apr 2011US 7,929,396 B2
- Electron beam applying apparatus and drawing apparatus21 Apr 2009US 7,522,510 B2
- Electron-beam writing device and electron-beam writing method24 Jan 2006US 6,989,536 B2
- Aberration evaluation pattern, aberration evaluation method, aberration correction method, electron beam drawing apparatus, electron microscope, master, stamper, recording medium, and structure9 Sep 2010US 2010/0227200 A1
- Surface emission type electron source and drawing device25 Mar 2010US 2010/0072875 A1
- Electron beam applying apparatus and drawing apparatus16 Jul 2009US 2009/0180373 A1
- Electron beam applying apparatus and drawing apparatus19 Apr 2007US 2007/0085003 A1
- Electron-beam writing device and electron-beam writing method27 Jan 2005US 2005/0018496 A1
Most cited
By later US patents