Electron beam applying apparatus and drawing apparatus

An electron beam applying apparatus for applying an electron beam to a surface of a material for recording information on the surface of the material, comprising:

• a thermal field emission type electron source emitting an electron beam;
• an electrostatic lens, disposed immediately below the electron source, acting as a condensing electrode for condensing the electron beam in a first angular aperture emitted by the electron source, in a second angular aperture smaller than the first angular aperture;
• a condenser lens disposed on a downstream side of the electrostatic lens, condensing the electron beam once condensed in the second aperture angle by the electrostatic lens, in a crossover point;
• an objective lens disposed on a downstream side of the condenser lens, condensing the electron beam once condensed in the crossover point by the condenser lens, on the surface of the material;
• an axis aligning coil disposed between the electrostatic lens and the condenser lens for correcting an axis shift of the electron beam applied to the condenser lens from the electrostatic lens;
• and a blanking electrode, disposed between the condenser lens and the objective lens, deflecting the electron beam condensed in the crossover point by the condenser lens.