H05H 2242/22
Dc, ac or pulsed generators
Official title: DC, AC or pulsed generators
H05H2242/22 (Dc, ac or pulsed generators) appears on 112 US grants and 134 published applications in this corpus.
Search patents in H05H- Granted patents
- 112
- Published applications
- 134
- Assignees
- 88
- Inventors
- 300
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2003 | 2 | 2 |
| 2004 | 0 | 0 |
| 2005 | 1 | 1 |
| 2006 | 0 | 3 |
| 2007 | 2 | 2 |
| 2008 | 0 | 4 |
| 2009 | 6 | 1 |
| 2010 | 1 | 1 |
| 2011 | 2 | 1 |
| 2012 | 0 | 8 |
| 2013 | 7 | 5 |
| 2014 | 2 | 5 |
| 2015 | 7 | 12 |
| 2016 | 10 | 12 |
| 2017 | 12 | 6 |
| 2018 | 6 | 6 |
| 2019 | 8 | 1 |
| 2020 | 7 | 4 |
| 2021 | 2 | 8 |
| 2022 | 4 | 4 |
| 2023 | 5 | 21 |
| 2024 | 11 | 9 |
| 2025 | 9 | 7 |
| 2026 | 8 | 11 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Methods and apparatus for generating atmospheric pressure, low temperature plasma6 Oct 2026US 12,757,313 B2TellaPure, LLC
- Electrode assembly for a plasma discharge25 Aug 2026US 12,720,664 B2Cinogy GmbH
- Plasma reactor and plasma chemical reactions18 Aug 2026US 12,708,890 B2Nanoplazz Technologies Ltd.
- Pulsed ion source28 Jul 2026US 12,696,375 B2Adelphi Technology, Inc.
- Remote plasma source (RPS) power coupling circuit and control system9 Jun 2026US 12,652,748 B2Jiangsu Shenzhou Semiconductor Technology Co., Ltd
- Modulated pulsed microwave waveform in a power source for achieving a desired electron energy distribution in a plasma27 Aug 2026US 2026/0255468 A1Starfire Industries LLC
- Nitric oxide generation process controls13 Aug 2026US 2026/0233997 A1Third Pole, Inc.
- Discharge and Modulation System and Method for Microwave-Radio Frequency (RF) Mixed Coupled Plasma23 Jul 2026US 2026/0214780 A1
- Pulsed Ion Source2 Jul 2026US 2026/0190209 A1Adelphi Technology, Inc.
- Efficient Plasma Driving30 Apr 2026US 2026/0122751 A1EHT Ventures LLC
Most cited
By later US patents
- Film forming method and film forming apparatus473US 8,586,484 B2Fuji Electric Co., Ltd. · 2013
- High-frequency device for generating a plasma arc for the treatment of biological tissue323US 6,565,558 B12003
- Charge removal from electrodes in unipolar sputtering system79US 9,620,340 B2Advanced Energy Industries, Inc. · 2017
- Charge removal from electrodes in unipolar sputtering system75US 9,287,098 B2Advanced Energy Industries, Inc. · 2016
- Additive synthesis of interleaved switch mode power stages for minimal delay in set point tracking73US 10,447,174 B1Advanced Energy Industries, Inc. · 2019