H05H 1/18
Wherein the fields oscillate at very high frequency
Official title: wherein the fields oscillate at very high frequency, e.g. in the microwave range {, e.g. using cyclotron resonance}
H05H1/18 (Wherein the fields oscillate at very high frequency) appears on 56 US grants and 20 published applications in this corpus.
Search patents in H05H- Granted patents
- 56
- Published applications
- 20
- Assignees
- 36
- Inventors
- 107
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 2 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 3 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 7 | 0 |
| 1988 | 6 | 0 |
| 1989 | 0 | 0 |
| 1990 | 3 | 0 |
| 1991 | 0 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 5 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 2 |
| 2006 | 1 | 1 |
| 2007 | 0 | 1 |
| 2008 | 0 | 0 |
| 2009 | 1 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 2 |
| 2012 | 0 | 0 |
| 2013 | 0 | 3 |
| 2014 | 0 | 0 |
| 2015 | 1 | 1 |
| 2016 | 0 | 0 |
| 2017 | 1 | 1 |
| 2018 | 0 | 0 |
| 2019 | 1 | 1 |
| 2020 | 1 | 0 |
| 2021 | 1 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 3 |
| 2024 | 0 | 0 |
| 2025 | 2 | 3 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Remote surface wave propagation for semiconductor chambers5 May 2026US 12,620,553 B2APPLIED Materials.Inc.
- Electron resonance source apparatus and method of use thereof15 Apr 2025US 12,279,357 B1
- High-energy plasma generator using radio-frequency and neutral beam power25 Mar 2025US 12,262,462 B2Wisconsin Alumni Research Foundation
- High-energy plasma generator using radio-frequency and neutral beam power30 Mar 2021US 10,966,310 B1Wisconsin Alumni Research Foundation
- Method and apparatus for periodic ion collisions3 Mar 2020US 10,580,534 B2
- Remote Surface Wave Propagation for Semiconductor Chamber13 Aug 2026US 2026/0237603 A1APPLIED Materials.Inc.
- Novel High-Efficiency Plasma/Pyrolytic Gas-phase Reactor with Enhanced Neutralization Capability6 Nov 2025US 2025/0339833 A1Icarus Thermal Solutions
- Microwave-cyclotron-resonance plasma thruster and associated operating method, and use16 Oct 2025US 2025/0324505 A1Christian-Albrechts-Universitaet zu Kiel
- High-Energy Plasma Generator Using Radio-Frequency and Neutral Beam Power4 Sep 2025US 2025/0280488 A1Wisconisn Alumni Research Foundation
- High-Energy Plasma Generator Using Radio-Frequency and Neutral Beam Power26 Oct 2023US 2023/0345612 A1Wisconsin Alumni Research Foundation
Most cited
By later US patents
- Method and apparatus for producing high density plasma using whistler mode excitation110US 5,225,740 AGeneral Atomics · 1993
- Folded waveguide coupler109US 4,728,910 AThe United States of America as represented by the United States Department of Energy · 1988
- Plasma generation in electron cyclotron resonance103US 4,952,273 AMicroscience Limited · 1990
- Electron cyclotron resonance plasma source and method of operation102US 5,370,765 AApplied Microwave Plasma Concepts, Inc. · 1994
- Cluster tool soft etch module and ECR plasma generator therefor96US 5,280,219 AMaterials Research Corporation · 1994