H05H 1/0031
By interferrometry
Official title: {by interferrometry}
H05H1/0031 (By interferrometry) appears on 4 US grants and 3 published applications in this corpus.
Search patents in H05H- Granted patents
- 4
- Published applications
- 3
- Assignees
- 3
- Inventors
- 10
- Latest grant
- 19 Feb 2019
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 1 |
| 2013 | 0 | 0 |
| 2014 | 1 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 1 |
| 2019 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Density and power controlled plasma antenna19 Feb 2019US 10,211,522 B2Smartsky Networks LLC
- Plasma monitoring device using a cylindrical hollow electrode1 Jul 2014US 8,767,203 B2Samsung Electronics Co., Ltd.
- Optical ionization detector29 Mar 1994US 5,298,755 AThe United States of America as represented by the United States Department of Energy
- Method of measuring the dc electric field and other tokamak parameters9 Jun 1992US 5,120,487 AThe United States of America as represented by the United States Department of Energy
- Density and power controlled plasma antenna1 Feb 2018US 2018/0034145 A1Smartsky Networks LLC
- Plasma Generating Units and Process Monitoring Devices and Semiconductor Process Apparatus Including the Same15 Mar 2012US 2012/0062887 A1Samsung Electronics Co., Ltd.
- Plasma torch for microwave induced plasmas3 Nov 2005US 2005/0242070 A1
Most cited
By later US patents